This article proposes a parallel dual‐metal‐gate structure (PDM) of AlGaN/GaN high‐electron‐mobility transistors (HEMTs) for high‐linearity applications. Cancellation of the third‐order derivative of the curve (is achieved by splitting the device into two subcells in parallel with different gate metals. The two subcells have different threshold voltages. When the same bias voltage is applied, the operating states of the two subcells are independently controlled by the gate bias voltages. The maximum transconductance () of the conventional single‐metal‐gate (SMG) HEMT, double‐metal‐gate (DMG) HEMT, and PDM‐HEMT is all comparable, whereas of the proposed structure is 75% lower than that of the SMG HEMT and 47.8% lower than that of the DMG HEMT. The effects of the differences and width ratios of the work function on are studied and compared, and a suitably designed PDM‐HEMT that can considerably improve linearity without degrading other performance aspects is obtained. This research has significant implications for high‐linearity applications.