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Huang, S. S.; Chen, Jen‐Sue

doi:10.1023/a:1013698006169

Cited by 23 publications

(7 citation statements)

References 14 publications

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“…Although the plasma species density increases with applied power, it is frequently observed in PECVD processes that this generally increases and tends to level off or decrease the film growth rate (given in thickness per unit of time) [48,49]. For the case of PECVD of TiO 2 using TTIP as a metal precursor, it was observed that the growth rate decreases with an increase in the plasma power [49][50][51].…”

Section: Effect Of Plasma Power/precursor Chemistry On Gpcmentioning

confidence: 99%

“…A variety of techniques have been employed to produce TiO 2 films, including physical vapor deposition (PVD) [12][13][14], chemical vapor deposition (CVD) [15,16], plasmaenhanced chemical vapor deposition (PECVD) [17,18], and atomic layer deposition (ALD) [19]. Among them, ALD has been recognized as the most suitable to achieve conformality, uniformity, and specific material properties on the nanoscale required in some of the aforementioned applications [19,20].…”

Section: Introductionmentioning

confidence: 99%

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Relationships among growth mechanism, structure and morphology of PEALD TiO₂films: the influence of O₂plasma power, precursor chemistry and plasma exposure mode

et al. 2016

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Titanium dioxide (TiO2) thin films have generated considerable interest over recent years, because they are functional materials suitable for a wide range of applications. The efficient use of the outstanding functional properties of these films relies strongly on their basic characteristics, such as structure and morphology, which are affected by deposition parameters. Here, we report on the influence of plasma power and precursor chemistry on the growth kinetics, structure and morphology of TiO2 thin films grown on Si(100) by plasma-enhanced atomic layer deposition (PEALD). For this, remote capacitively coupled 13.56 MHz oxygen plasma was used to act as a co-reactant during the ALD process using two different metal precursors: titanium tetrachloride (TiCl4) and titanium tetraisopropoxide (TTIP). Furthermore, we investigate the effect of direct plasma exposure during the co-reactant pulse on the aforementioned material properties. The extensive characterization of TiO2 films using Rutherford backscattering spectroscopy, ellipsometry, x-ray diffraction (XRD), field-emission scanning electron microscopy, and atomic force microscopy (AFM) have revealed how the investigated process parameters affect their growth per cycle (GPC), crystallization and morphology. The GPC tends to increase with plasma power for both precursors, however, for the TTIP precursor, it starts decreasing when the plasma power is greater than 100 W. From XRD analysis, we found a good correlation between film crystallinity and GPC behavior, mainly for the TTIP process. The AFM images indicated the formation of films with grain size higher than film thickness (grain size/film thickness ratio ≈20) for both precursors, and plasma power analysis allows us to infer that this phenomenon can be directly related to the increase of the flux of energetic oxygen species on the substrate/growing film surface. Finally, the effect of direct plasma exposure on film structure and morphology was evidenced showing that the grid removal causes a drastic reduction in the grain size, particularly for TiO2 synthesized using TiCl4.

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Section: Effect Of Plasma Power/precursor Chemistry On Gpcmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Relationships among growth mechanism, structure and morphology of PEALD TiO₂films: the influence of O₂plasma power, precursor chemistry and plasma exposure mode

et al. 2016

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“…Nanostructured TiO 2 films have attracted attention for a great variety of applications, such as dye-sensitized solar cells, , photocatalysis, − various cleaning devices, − and antifog windows. − A number of techniques have been used to make TiO 2 films, including evaporation, , sputtering, , sol−gel, , chemical vapor deposition (CVD), − plasma-enhanced chemical vapor deposition, and pulsed laser deposition . It is known that many of these applications would benefit from high surface to volume particles.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of TiO₂ Nanofibers from a Mesoporous Silica Film

Xiong

Balkus

2005

Chem. Mater.

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TiO2 nanofibers have been made by impregnating a mesoporous silica film with TiCl4 followed by hydrolysis in air. The TiO2 nanofiber morphology can be varied by controlling the pore size and pore volume of the mesoporous silica film. TiO2 nanofiber diameters were in the range of 30−200 nm. The as-synthesized nanofibers are amorphous but crystallize to anatase at 250 °C without a change in morphology.

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“…Due to the densification of the deposited TiO 2 film in rf-biased PECVD, the anatase phase dominated over the rutile phase below 400 • C, while the rutile phase became dominant at a higher annealing temperature. An interesting comparison between low-pressure chemical vapor deposition (LP-CVD) and PECVD-grown films revealed that PECVD produces a smoother, denser, and more continuous TiO 2 layer than does LPCVD [79]. However, in contrast to LPCVD, two effects, i.e., a lower deposition rate and poor crystallinity, were drawbacks of PECVD in this particular study.…”

Section: Plasma-enhanced Chemical Vapor Depositionmentioning

confidence: 66%

Atmospheric Pressure Plasma Deposition of TiO2: A Review

et al. 2020

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Atmospheric pressure plasma (APP) deposition techniques are useful today because of their simplicity and their time and cost savings, particularly for growth of oxide films. Among the oxide materials, titanium dioxide (TiO2) has a wide range of applications in electronics, solar cells, and photocatalysis, which has made it an extremely popular research topic for decades. Here, we provide an overview of non-thermal APP deposition techniques for TiO2 thin film, some historical background, and some very recent findings and developments. First, we define non-thermal plasma, and then we describe the advantages of APP deposition. In addition, we explain the importance of TiO2 and then describe briefly the three deposition techniques used to date. We also compare the structural, electronic, and optical properties of TiO2 films deposited by different APP methods. Lastly, we examine the status of current research related to the effects of such deposition parameters as plasma power, feed gas, bias voltage, gas flow rate, and substrate temperature on the deposition rate, crystal phase, and other film properties. The examples given cover the most common APP deposition techniques for TiO2 growth to understand their advantages for specific applications. In addition, we discuss the important challenges that APP deposition is facing in this rapidly growing field.

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Untitled

Cited by 23 publications

References 14 publications

Relationships among growth mechanism, structure and morphology of PEALD TiO₂films: the influence of O₂plasma power, precursor chemistry and plasma exposure mode

Relationships among growth mechanism, structure and morphology of PEALD TiO₂films: the influence of O₂plasma power, precursor chemistry and plasma exposure mode

Fabrication of TiO₂ Nanofibers from a Mesoporous Silica Film

Atmospheric Pressure Plasma Deposition of TiO2: A Review

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Untitled

Cited by 23 publications

References 14 publications

Relationships among growth mechanism, structure and morphology of PEALD TiO2films: the influence of O2plasma power, precursor chemistry and plasma exposure mode

Relationships among growth mechanism, structure and morphology of PEALD TiO2films: the influence of O2plasma power, precursor chemistry and plasma exposure mode

Fabrication of TiO2 Nanofibers from a Mesoporous Silica Film

Atmospheric Pressure Plasma Deposition of TiO2: A Review

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Product

Resources

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Relationships among growth mechanism, structure and morphology of PEALD TiO₂films: the influence of O₂plasma power, precursor chemistry and plasma exposure mode

Relationships among growth mechanism, structure and morphology of PEALD TiO₂films: the influence of O₂plasma power, precursor chemistry and plasma exposure mode

Fabrication of TiO₂ Nanofibers from a Mesoporous Silica Film