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Petrov, G. M.; Petrova, Ts.

doi:10.1023/a:1021323714026

Cited by 8 publications

(2 citation statements)

References 63 publications

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“…25 The gas phase plasma chemistry and thermochemical input for H/C/Ar mixtures are taken from a range of sources. These include the detailed reaction mechanism for neutral C x H y species, 25,26 plasma-chemical reactions, 15,26 collision processes in a hydrogen plasma, along with cross sections for e-H and e-H 2 collisions [27][28][29][30][31][32][33] and e-C x H y cross sections. 34,35 The plasma-chemical kinetics mechanism includes more than 240 direct and reverse reactions for 30 neutral species ͓C, CH, CH 2 ͑X͒ ͑henceforth 3 , Ar + , and ArH + ͔͒.…”

Section: D Modelmentioning

confidence: 99%

Plasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operating with C/H/Ar gas mixtures

Mankelevich

Ashfold

2008

Journal of Applied Physics

104

222

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Microwave ͑MW͒ plasma-enhanced chemical vapor deposition ͑PECVD͒ reactors are widely used for growing diamond films with grain sizes spanning the range from nanometers through microns to millimeters. This paper presents a detailed description of a two-dimensional model of the plasma-chemical activation, transport, and deposition processes occurring in MW activated H/C/Ar mixtures, focusing particularly on the following base conditions: 4.4%CH 4 / 7%Ar/balance H 2 , pressure p = 150 Torr, and input power P = 1.5 kW. The model results are verified and compared with a range of complementary experimental data in the companion papers. These comparators include measured ͑by cavity ring down spectroscopy͒ C 2 ͑a͒, CH͑X͒, and H͑n =2͒ column densities and C 2 ͑a͒ rotational temperatures, and infrared ͑quantum cascade laser͒ measurements of C 2 H 2 and CH 4 column densities under a wide range of process conditions. The model allows identification of spatially distinct regions within the reactor that support net CH 4 → C 2 H 2 and C 2 H 2 → CH 4 conversions, and provide a detailed mechanistic picture of the plasma-chemical transformations occurring both in the hot plasma and in the outer regions. Semianalytical expressions for estimating relative concentrations of the various C 1 H x species under typical MW PECVD conditions are presented, which support the consensus view regarding the dominant role of CH 3 radicals in diamond growth under such conditions.

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Section: D Modelmentioning

confidence: 99%

Plasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operating with C/H/Ar gas mixtures

Mankelevich

Ashfold

2008

Journal of Applied Physics

104

222

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“…Ganeev et al [7] applied neon plasma for effective ionization of oxygen and fluorine in pulsed glow discharge. Petrov et al [8] have shown Ne-H 2 mixture more advantageous over the pure H 2 hollow cathode discharge for the production of negative hydrogen ions.…”

Section: Introductionmentioning

confidence: 99%

Diagnostic study of capacitively coupled neon rf plasma with traces of O₂/H₂ at intermediate pressure

Baghel¹,

Şahi̇n²,

Agrawal³

et al. 2022

J. Phys. D: Appl. Phys.

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We have performed the non-invasive diagnostic study of capacitively coupled Ne-O2/H2 mixture plasma through the Optical emission spectroscopy (OES) coupled with a suitable Collisional Radiative (CR) model. Capacitively coupled neon radio-frequency (rf) discharge (flowing downstream) with small admixture of O2/H2 have been generated in a vacuum chamber using 13.56 MHz rf signal and 120 W power supply. Keeping O2 and H2 flow rates fixed at 0.01 and 0.015 LPM respectively, the neon flow rate has been varied as 0.3, 0.4, 0.5, 0.6, 0.7 and 0.8 LPM to obtain different mixture concentration of Ne-O2 and Ne-H2 discharge. The pressure in the chamber has been observed in intermediate range (~500-25000 Pa) for different mixture concentrations. Optical emission spectroscopy (OES) measurements are recorded at various operating conditions in the wavelength range from 200 nm to 1200 nm. To extract the information of plasma parameters from the OES measurements, a comprehensive fine-structure resolved collisional radiative (CR) model has been developed. In the diagnostic process, five intense Ne-I emission lines at 594.48, 607.43, 633.44, 638.30, 703.24 nm are used. The CR model considers all the important processes i.e. electron impact excitation, electron impact de-excitation, radiative decay, ionization, two-three body recombination, and diffusion. The quenching process of 1s (1s5,1s4,1s3) levels of neon by the O2/H2 molecule has been included in the model. Radiative transitions from the upper levels to the ground state (1S0) and to the 1s levels of neon are corrected for self-absorption. The electron temperature (Te) and electron density (ne) of the plasma have been extracted for all the mixture concentrations of Ne-O2 and Ne-H2. With the different mixture concentrations of O2/H2 in neon discharge, the variation of population of metastable levels (1s5, 1s3) of neon and intensities of 656.28 nm of hydrogen and 777.4 nm of oxygen lines have been reported and discussed.

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Energy-transfer processes in neon-hydrogen mixtures excited by electron beams

Morozov

Krücken

Ulrich

et al. 2005

The Journal of Chemical Physics

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Energy- and charge-transfer processes in neon-hydrogen mixtures (500-1400 hPa neon and 0.001-3 hPa hydrogen partial pressures) excited by a pulsed low-energy (approximately 10 keV) electron beam were investigated using time-resolved spectroscopy. Time spectra of the hydrogen Lyman-alpha line, neon excimer emission (second continuum), and neon atomic lines (3p-3s transitions) were recorded. The time-integrated intensity of the Lyman-alpha emission was measured for the same range of gas mixtures. It is shown that direct energy transfer from Ne*2 excimers and neon atoms in the four lowest excited states as well as recombination of H3+ ions are the main channels populating atomic hydrogen in the n=2 state. A rate constant of (4.2+/-1.4)x10(-11) cm3 s(-1) was obtained for the charge transfer from Ne2+ ions to molecular hydrogen. A lower limit for the depopulation rate constant of Ne*2 excimers by molecular hydrogen (combination of energy transfer and ionization) was found to be 1.0 x 10(-10) cm3 s(-1).

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Untitled

Cited by 8 publications

References 63 publications

Plasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operating with C/H/Ar gas mixtures

Plasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operating with C/H/Ar gas mixtures

Diagnostic study of capacitively coupled neon rf plasma with traces of O₂/H₂ at intermediate pressure

Energy-transfer processes in neon-hydrogen mixtures excited by electron beams

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Untitled

Cited by 8 publications

References 63 publications

Plasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operating with C/H/Ar gas mixtures

Plasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operating with C/H/Ar gas mixtures

Diagnostic study of capacitively coupled neon rf plasma with traces of O2/H2 at intermediate pressure

Energy-transfer processes in neon-hydrogen mixtures excited by electron beams

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Diagnostic study of capacitively coupled neon rf plasma with traces of O₂/H₂ at intermediate pressure