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Puspharajah, P; Radhakrishna, S.; Arof, A.K.

doi:10.1023/a:1018657424566

Cited by 156 publications

(50 citation statements)

References 9 publications

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“…A highly transparent ZnO films have been prepared by many different deposition techniques and their corresponding deposition parameters play an important role in controlling the morphology and physical properties of the nanostructures. Both physical deposition, including thermal evaporation, sputtering, spray pyrolysis, metal organic chemical vapor deposition (MOCVD), pulsed laser deposition, molecular beam epitaxy (MBE) [7][8][9][10][11][12][13][14][15], and chemical synthetic routes, including hydrothermal, solvo-thermal, sol-gel, electrochemical, chemical bath deposition [16][17][18][19][20][21][22][23][24][25][26] have been successfully employed to prepare a wide variety of ZnO nanostructures. The physical deposition routes have the advantages of producing high-quality materials, but also the disadvantage of the need for high temperature.…”

Section: Introductionmentioning

confidence: 99%

Studies on Structural, Optical and Electrical Properties of ZnO Thin Films Prepared by the Spray Pyrolysis Method

Nehru¹,

Umadevi²,

Sanjeeviraja³

2012

IJME

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Zinc oxide transparent thin films have been deposited on glass substrates by a pneumatic spray pyrolysis technique. Surface investigations such as AFM, SEM and XRD patterns of the films were investigated for as-deposited and annealed in air atmosphere. The morphology of the films is strongly related to the annealing temperature. By XRD, the amorphous phase is identified for as-deposited films and it changes to polycrystalline with the (1 0 0) and (1 0 1) as preferential crystallographic orientation for annealed samples. The as-deposited films exhibited highest optical transmittance and the direct band gap energy was found to vary from 3.23 to 3.07 eV with annealing temperatures. The electrical parameters of the samples were obtained by applying the dc four-probe technique. The effects of annealing environment on the luminescence characteristics of ZnO thin films were investigated by PL films are described here.

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Section: Introductionmentioning

confidence: 99%

Studies on Structural, Optical and Electrical Properties of ZnO Thin Films Prepared by the Spray Pyrolysis Method

Nehru¹,

Umadevi²,

Sanjeeviraja³

2012

IJME

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“…They have been used as an antiferromagnetic material, 1) p-type transparent conducting films, 2) material for electrochromic display devices 3) and in functional sensor layers for chemical sensors. 4) These films have been fabricated using various physical and chemical vapor deposition techniques, such as spray pyrolysis, 5) plasmaenhanced chemical vapor deposition 6) and reactive sputtering.…”

Section: Introductionmentioning

confidence: 99%

Effect of Film Thickness on Structural and Electrical Properties of Sputter-Deposited Nickel Oxide Films

Chen

Hwang

2005

Mater. Trans.

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This work studies dependences of resistivity, carrier concentration, mobility and structural properties on the thickness of nickel oxide (NiO) films deposited onto glass substrates by RF magnetron sputtering in a pure oxygen atmosphere at an RF power 200 W. The electrical properties were measured by Hall Effect measurements. The X-ray diffraction (XRD) and transmission electron microscope (TEM) analyses of nickel oxide films indicates that these films are polycrystalline when the samples are prepared with an unheated substrate (T s ¼ 303 K) and using a substrate at a higher substrate temperature (T s ¼ 673 K). The thickness of the films varied in the range from 50 to 300 nm. The variations of the microstructural parameters, such as crystallite size (L), dislocation density (), stacking fault probability (), strain (") and density (D), with film thickness and substrate temperature were investigated. The results show the crystallite sizes increaser as the thickness of the film increases. The variation of the dislocation density and the stacking fault probabilities and strain decrease as the thickness increases. The resistivity of NiO film is increased with an increase in film thickness, which is related to the decrease of carrier concentration with film thickness. The NiO film with a thickness of 200 nm has a minimum resistivity of 0:69 Â 10 À2 m when deposited at substrate temperature of 303 K.

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“…4) Furthermore, (100)-and (111)-oriented NiO films can be used as buffer layers that are deposited on oxide films with other orientations, such as c-axis-oriented perovskitetype ferromagnetic films and superconducting films, [5][6][7] because they are chemically stable and the oxygen ion lattice constant of NiO is similar to that of the oriented oxide films. Such films have been fabricated using various physical and chemical vapor deposition techniques, including spray pyrolysis, 8,9) electron beam evaporation, 10) pulsed laser deposition, 11) plasma-enhanced chemical vapor deposition 1,12) and reactive sputtering. 3,13,14) Reactive sputtering is the most widely used among these methods.…”

Section: Introductionmentioning

confidence: 99%

Effects of Substrate Temperature and Oxygen Pressure on Crystallographic Orientations of Sputtered Nickel Oxide Films

Chen

et al. 2005

Mater. Trans.

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Nickel oxide (NiO) films with NaCl-type structure were deposited onto Corning glass substrates at different substrate temperatures by radio-frequency (RF) magnetron sputtering under an RF power of 200 W. The resulting films were analyzed by grazing-incidence X-ray diffraction, ultrahigh resolution scanning electron microscopy (HR-SEM) and high-resolution transmission electron microscopy (HR-TEM). The relationships among the gas ratio of O 2 , substrate temperature, preferred orientation and microstructure of the NiO films were investigated. Those films deposited at a substrate temperatures of 303 or 473 K with the ratio of oxygen varying from 0 to 100% displayed a (111) preferred orientation. At the substrate temperature of 673 K, while the (111)-orientated film was obtained under a low ratio of oxygen (< 50% O 2 ), a (200) preferred orientation was developed under 100% oxygen. All the films have a columnar structure with the growth direction perpendicular to the surface. The origin of the preferred orientations is also discussed.

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Untitled

Cited by 156 publications

References 9 publications

Studies on Structural, Optical and Electrical Properties of ZnO Thin Films Prepared by the Spray Pyrolysis Method

Studies on Structural, Optical and Electrical Properties of ZnO Thin Films Prepared by the Spray Pyrolysis Method

Effect of Film Thickness on Structural and Electrical Properties of Sputter-Deposited Nickel Oxide Films

Effects of Substrate Temperature and Oxygen Pressure on Crystallographic Orientations of Sputtered Nickel Oxide Films

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