7.8-GHz Graphene-Based 2-μm Monolithic Waveguide Laser

Ren, Yingying; Brown, G.; Mary, Rose; Demetriou, Giorgos; Popa, D.; Torrisi, Felice; Ferrari, Andrea C.; Chen, Feng; Kar, A. K.

doi:10.1109/jstqe.2014.2350016

Cited by 35 publications

(7 citation statements)

References 53 publications

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“…FLG films with thickness ~150 nm, transmittance ~50%, roughness ~8 nm and R s ~ 1-2 kΩ sq −1 were prepared as conductive electrodes for biological applications [432]. These were also exploited in photonic applications, demonstrating sub-50 fs compressed pulses from a FLG-mode locked fiber laser [539], power scaling lasers [540], and monolithic waveguide lasers [541]. To produce these, a 25 mm diameter membrane filtration setup was used.…”

Section: Iii31 Vacuum Filtrationmentioning

confidence: 99%

Production and processing of graphene and related materials

et al. 2020

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We present an overview of the main techniques for production and processing of graphene and related materials (GRMs), as well as the key characterization procedures. We adopt a ‘hands-on’ approach, providing practical details and procedures as derived from literature as well as from the authors’ experience, in order to enable the reader to reproduce the results. Section is devoted to ‘bottom up’ approaches, whereby individual constituents are pieced together into more complex structures. We consider graphene nanoribbons (GNRs) produced either by solution processing or by on-surface synthesis in ultra high vacuum (UHV), as well carbon nanomembranes (CNM). Production of a variety of GNRs with tailored band gaps and edge shapes is now possible. CNMs can be tuned in terms of porosity, crystallinity and electronic behaviour. Section covers ‘top down’ techniques. These rely on breaking down of a layered precursor, in the graphene case usually natural crystals like graphite or artificially synthesized materials, such as highly oriented pyrolythic graphite, monolayers or few layers (FL) flakes. The main focus of this section is on various exfoliation techniques in a liquid media, either intercalation or liquid phase exfoliation (LPE). The choice of precursor, exfoliation method, medium as well as the control of parameters such as time or temperature are crucial. A definite choice of parameters and conditions yields a particular material with specific properties that makes it more suitable for a targeted application. We cover protocols for the graphitic precursors to graphene oxide (GO). This is an important material for a range of applications in biomedicine, energy storage, nanocomposites, etc. Hummers’ and modified Hummers’ methods are used to make GO that subsequently can be reduced to obtain reduced graphene oxide (RGO) with a variety of strategies. GO flakes are also employed to prepare three-dimensional (3d) low density structures, such as sponges, foams, hydro- or aerogels. The assembly of flakes into 3d structures can provide improved mechanical properties. Aerogels with a highly open structure, with interconnected hierarchical pores, can enhance the accessibility to the whole surface area, as relevant for a number of applications, such as energy storage. The main recipes to yield graphite intercalation compounds (GICs) are also discussed. GICs are suitable precursors for covalent functionalization of graphene, but can also be used for the synthesis of uncharged graphene in solution. Degradation of the molecules intercalated in GICs can be triggered by high temperature treatment or microwave irradiation, creating a gas pressure surge in graphite and exfoliation. Electrochemical exfoliation by applying a voltage in an electrolyte to a graphite electrode can be tuned by varying precursors, electrolytes and potential. Graphite electrodes can be either negatively or positively intercalated to obtain GICs that are subsequently exfoliated. We also discuss the materials that can be amenable to exfoliation, by ...

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Section: Iii31 Vacuum Filtrationmentioning

confidence: 99%

Production and processing of graphene and related materials

et al. 2020

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“…[56] In addition, some low-threshold and efficient mid-IR laser sources were realized with high pulse repetition rate by combining Tm:Lu 2 O 3 optical properties with the ultrafast laser inscription. [57,58] Although semiconductor lasers and waveguide lasers can generate controlled rays, output and power scaling remain challenging.…”

Section: Introductionmentioning

confidence: 99%

2D Materials for Nonlinear Photonics and Electro‐Optical Applications

Yin

Jiang

Huang

et al. 2021

Adv Materials Inter

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that satisfy the growing needs for compact, small foot-print, highly efficient and broadband photonic and optoelectronic devices. In other words, the development between SA technologies and lasers is almost isochronous. By 1983, several mode-locked fiber lasers with actively doped fiber amplifiers were demonstrated largely driven by improvements in low-loss optical fibers. However, mode-locking with a dye SA was unstable in Nd:fibers at the time. [5] The early 1990s saw the semiconductor SA mirror (SESAM) invention which was a milestone in the realization of stable passive mode-locked pulses [6,7] and stable Q-switching. However, SESAM progress was impeded by the narrow operation bandwidth, challenging fabrication process, slow relaxation time and most importantly a weak mid-infrared (mid-IR) response. By contrast, 2D nanomaterials can possess shorter relaxation times with a highly efficient broadband response covering even the mid-IR. The fabrication methods, nonlinear optical properties and applications in optics, biomedicine, and other fields of 2D materials are shown in Figure 1. 2D materials are now the spotlight of SA research applications because of these unique properties along with stable quantum confinement, higher mechanical stability, and an inherently small-footprint. [8][9][10] Graphene has been a breakthrough 2D NLO material for a wide range of topics such as broadband optical modulation, [11] optical frequency mixing, [12] ultrafast laser generation, [13][14][15][16][17][18][19][20] and surface plasmonic. [21] Nevertheless, the development of this material is still limited to some extent [22] due to its innate gapless band structure and the weak electronic on/off ratio. Topological insulators (TIs) reveal a large modulation depth. However, the fabrication of TIs is complicated because of their two elements composition. [23][24][25] Transition metal dichalcogenides (TMDs) are unusable in the mid-IR region because of their large bandgaps. [26] In Group-VA monoelemental materials, black phosphorus (BP) is famous for the characteristic layer number dependent bandgap. [27][28][29][30][31][32][33][34][35] However, monolayer or fewlayer BP lacks of chemical stability at ambient conditions. [36,37] In addition, another Group-VA material, semiconducting antimonene, is relatively stable under ambient environment with a wide bandgap. [38] Bulk antimonene has great potential to become a TI as well as quantum spin Hall phase producer when the number of layers is under 22, respectively. [39] On top of this, antimonene is very chemically stable. It has good thermal conductivity, [40] high mobility, [41] excellent thermoelectric figure of merit, [42] and good optical properties, [43][44][45][46] which 2D materials have received significant attention from the scientific community due to their unique structures and excellent physical properties. A lot of applications are explored based on graphene, topological insulators, and transition metal dichalcogenides. With further development of 2D materials, other Group-VA...

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“…Combining the unique Tm:Lu2O3 optical properties with the ULI waveguide laser geometry would provide a means to produce compact, low-threshold and efficient laser sources near 2 μm with the potential for high pulse repetition rate ultrafast operation [17,18]. It makes such laser sources also compatible with chip technology that will create new opportunities in mid-IR sensing and metrology, medical applications [19] and as compact pumps for mid-IR supercontinuum generation.…”

Section: Introductionmentioning

confidence: 99%

19 µm waveguide laser fabricated by ultrafast laser inscription in Tm:Lu_2O_3 ceramic

Morris¹,

Stevenson

Bookey³

et al. 2017

Opt. Express

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The ultrafast laser inscription technique has been used to fabricate channel waveguides in Tm-doped LuO ceramic gain medium for the first time to our knowledge. Laser operation has been demonstrated using a monolithic microchip cavity with a continuous-wave Ti:sapphire pump source at 796 nm. The maximum output power achieved from the Tm:LuO waveguide laser was 81 mW at 1942 nm. A maximum slope efficiency of 9.5% was measured with the laser thresholds observed to be in the range of 50-200 mW of absorbed pump power. Propagation losses for this waveguide structure are calculated to be 0.7 dB⋅cm ± 0.3 dB⋅cm at the lasing wavelength.

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7.8-GHz Graphene-Based 2-μm Monolithic Waveguide Laser

Cited by 35 publications

References 53 publications

Production and processing of graphene and related materials

Production and processing of graphene and related materials

2D Materials for Nonlinear Photonics and Electro‐Optical Applications

19 µm waveguide laser fabricated by ultrafast laser inscription in Tm:Lu_2O_3 ceramic

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