2016
DOI: 10.1002/sdtp.10849
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67-1: Novel LTPS Technology for Large Substrate

Abstract: We developed Partial Laser Anneal Silicon (PLAS) TFT of novel LTPS technology for large substrate, which had the mobility of 28.1 cm2/Vs in bottom gate structure. Moreover there is no limit of substrate size, such as Gen10 and more. This innovative technology can enable the conversion from an α‐Si TFT to a high mobility TFT most easily and inexpensively. Photo‐stability of PLAS will be suitable to OLED backplane, HDR TV, and outdoor IDP.

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Cited by 11 publications
(5 citation statements)
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“…The crystallizations of the selected a-Si area including TFT active regions on a glass substrate have been proposed in order to improve crystallization throughput and to make the CW laser Lateral Crystallization (CLC) LTPS-TFTs having a large NMOS mobility of 500 cm 2 /Vs [1]. Similar methods have been developed for micro-crystalline Si TFTs having NMOS mobility of 3 cm 2 /Vs [2], and LTPS-TFTs having NMOS mobility of 28 cm 2 /Vs [3,4]. These technologies are easily scaled up for a larger mother substrate compared to the conventional excimer laser crystallization with a long line beam [5,6].…”
Section: Introductionmentioning
confidence: 99%
“…The crystallizations of the selected a-Si area including TFT active regions on a glass substrate have been proposed in order to improve crystallization throughput and to make the CW laser Lateral Crystallization (CLC) LTPS-TFTs having a large NMOS mobility of 500 cm 2 /Vs [1]. Similar methods have been developed for micro-crystalline Si TFTs having NMOS mobility of 3 cm 2 /Vs [2], and LTPS-TFTs having NMOS mobility of 28 cm 2 /Vs [3,4]. These technologies are easily scaled up for a larger mother substrate compared to the conventional excimer laser crystallization with a long line beam [5,6].…”
Section: Introductionmentioning
confidence: 99%
“…Although LTPS top-gate TFTs (TG-TFTs) have been widely applied for driving OLEDs, BG TFTs are also in high demand because of their compatibility with fabrication process of a-Si BG-TFTs. Several groups have proposed LTPS BG-TFTs in which a-Si precursor films are crystallized by either excimer laser crystallization (ELC), [6][7][8][9] or cw laser crystallization (CLC), 10,11,12) However, the uniformity of TFTs is also an important issue for high-definition displays because the variation of grain numbers in the channel region causes characteristic deviation of TFTs. Single-crystal Si (c-Si) TFTs provide the ultimate solution to this challenge.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, LTPS backplane panel can be designed higher aperture ratio, resolution and thinner boarder. However, AMOLED displays with LTPS TFTs suffer from non-uniformity due to the variation of the threshold voltage (Vth) and mobility [1,2]. Usually, a compensation pixel circuit [3][4][5] is adopted to solve the problem, which need a scan circuit to enable compensation and data writing for each row, and an emission circuit to turn OLED off during compensation period and data writing period.…”
Section: Introductionmentioning
confidence: 99%