2008 IEEE International SOC Conference 2008
DOI: 10.1109/socc.2008.4641491
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65NM sub-threshold 11T-SRAM for ultra low voltage applications

Abstract: In this paper a new ultra low power SRAM cell is proposed. In the proposed SRAM topology, additional circuitry has been added to a standard 6T-SRAM cell to improve the static noise margin (SNM) and the performance. Foundry models for a 65 nm standard CMOS process were used for obtaining reliable simulated results. The circuit was simulated for supply voltages from 0.2V to 0.35V verifying the robustness of the proposed circuit for different supply voltages. The simulations show a significant improvement in SNM … Show more

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Cited by 23 publications
(9 citation statements)
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“…These solutions span two different dimensions. The first dimension covers designing SRAM bit-cells by up-sizing transistors to achieve higher functionality margins [Liu and Kursun 2007;Moradi et al 2008;Morita et al 2007;Chen et al 2007]. The second dimension covers designing more robust SRAM cells (e.g., Schmitt trigger (ST) SRAM cell [Kulkarni et al 2007]) to ensure improved performance at low fault rates.…”
Section: Circuit-level Solutionsmentioning
confidence: 99%
See 1 more Smart Citation
“…These solutions span two different dimensions. The first dimension covers designing SRAM bit-cells by up-sizing transistors to achieve higher functionality margins [Liu and Kursun 2007;Moradi et al 2008;Morita et al 2007;Chen et al 2007]. The second dimension covers designing more robust SRAM cells (e.g., Schmitt trigger (ST) SRAM cell [Kulkarni et al 2007]) to ensure improved performance at low fault rates.…”
Section: Circuit-level Solutionsmentioning
confidence: 99%
“…The first category relies on circuit-level techniques that up-size the transistors or implement a more robust SRAM cell (e.g., 8-T or 10-T SRAM cell instead of the traditional 6-T version) [Liu and Kursun 2007;Moradi et al 2008;Morita et al 2007;Chen et al 2007;Maric et al 2013;Kulkarni et al 2007]. This results in an increase in area (33% to 100%) of the SRAM cell, reducing the effective cache capacity within a given area budget.…”
Section: Introductionmentioning
confidence: 99%
“…There have been several efforts at the device level to investigate custom SRAM architectures to improve the reliability of embedded memories, from re-arrangement of the physical-addresses [76], the introduction of customized logic [84], and different cell sizes [17], [53], [72] at the cost of increases in area.…”
Section: B Reliable Memory Subsystemsmentioning
confidence: 99%
“…Due to the progress of the semiconductor process, the threshold voltage (V TH ) of transistors is decreasing. Smaller V TH leads to bigger leakage current [6,7]. The performance of SRAM would deteriorate as the bit-line leakage increases, and the read operation would even fail when the amount of leakage reaches a critical value [8,9,10,11].…”
Section: Introductionmentioning
confidence: 99%