In this paper, issues associated with the recent development third generation detectors are discussed. In this class of detectors HgCdTe photodiodes, type II superlattice photodiodes, quantum-well infrared photoconductors (QWIPs), and quantum dot IR photodetectors (QDIPs) are considered. The main challenges facing multicolor devices concern complicated device structures, thicker and multilayer material growth, and more difficult device fabrication, especially when the array size gets larger and pixel size gets smaller. Also discussion on the on-going detector technology efforts is presented.