49.2: Innovative Laser Patterning of Black Matrix for LCD Manufacture

Abstract

Patterning the Black Matrix (BM) layer in an LCD typically employs wet‐etch lithography. This paper describes an alternative laser‐based patterning technique called Assist Liquid™. This technique meets rigorous customer targets and may offer a more cost effective solution for LCD manufacture.

Quasi-Black Mask for Low-Cost LCDs by Patterned Alignment Films Formed by an Electro-Spray Deposition Method

“…A black mask (BM) [18], [19] is a layer used to improve the display quality by suppressing light leakage. In general, the BM is formed by a photolithography process.…”

Recovery of indium from TFT and CF glasses of LCD wastes using NaOH-enhanced sub-critical water

“…The dotted line shows the result without NaOH [12], where it was much smaller than that with 0.1 N NaOH. CF glass consists of 2-3 m thin color pigments, an overcoat layer and a 1 m thin black matrix [23,24]. These organic substances may be more susceptible to attacks from OH − in sub-CW.…”

Area-Selective Atomic Layer Deposition of In2O3:H Using a μ-Plasma Printer for Local Area Activation

“…6 Furthermore, more than six steps are typically required to fabricate patterned TCOs. 6−8,16 Hence, several applications that require millimeter and submillimeter patterned TCO films would benefit from the availability of alternative patterning methods. 9−12 …”

“…To date, methods used for patterning TCOs such as such as rapid laser patterning often have limited uniformity and resolution or suffer from material degradation during the etch processes . Furthermore, more than six steps are typically required to fabricate patterned TCOs. − , Hence, several applications that require millimeter and submillimeter patterned TCO films would benefit from the availability of alternative patterning methods. − …”

“…6 Furthermore, more than six steps are typically required to fabricate patterned TCOs. [6][7][8]16 Hence, several applications that require millimeter and submillimeter patterned TCO films would benefit from the availability of alternative patterning methods. 9−12 Area-selective atomic layer deposition (AS-ALD) has emerged as a promising solution to push device manufacturing toward new frontiers.…”