2017
DOI: 10.1002/sdtp.11690
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37‐2: Plane Source Evaporation Techniques for Super Ultra High Resolution Flexible AMOLED

Abstract: The vacuum thermal evaporation (VTE) patterning technique using linear type evaporation sources has 3μm of minimum shadow distance so that the high resolution (577ppi, 2K QHD) AMOLED can be manufactured. However, there is a shadow limitation of the neighboring patterns overlapped when manufacturing the ultra-high resolution (800ppi, 4K UHD) AMOLED. The plane source VTE shows recently of 1.1μm~1.3μm in shadow distance measurements and it verifies the possibility of manufacturing the ultra-high resolution AMOLED… Show more

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Cited by 3 publications
(5 citation statements)
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“…The higher material utilization, low temperature process, and nonparticle processes are also expected in addition to the very short shadow distance and non-PL shift measurements discussed. [2] In particular, Hwang's mixing technique can improve the material utilization by over 5 times in 6G substrate process. [7]…”
Section: Resultsmentioning
confidence: 99%
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“…The higher material utilization, low temperature process, and nonparticle processes are also expected in addition to the very short shadow distance and non-PL shift measurements discussed. [2] In particular, Hwang's mixing technique can improve the material utilization by over 5 times in 6G substrate process. [7]…”
Section: Resultsmentioning
confidence: 99%
“…For an example, the pattern width needs to be 4um and the pattern distance should be 20um for producing the 2250ppi AMOLED devies. [2] Let us consider why the low resolution device is. As shown in Fig.…”
Section: Fig 3 Shadowed Pattern By Linear Sourcementioning
confidence: 99%
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“…By the vertical vapor deposition, the smaller angle of incidence of the molecules makes the less shadow distance behind the FMM. [2,3,15]…”
Section: Plane Source Evaporationmentioning
confidence: 99%