355 nm All-Solid-State Ultraviolet Laser Direct Writing and Etching of Micro-Channels in Borosilicate Glass

Qisi, 李奇思 Li; Ting, 梁庭 Liang; Cheng, 雷程 Lei; Wangwang, 李旺旺 Li; Lina, 林立娜 Lin; Jiaoyan, 杨娇燕 Yang; Jijun, 熊继军 Xiong

doi:10.3788/cjl201845.0802003

Cited by 1 publication

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“…4 that when the duty ratio is ≥ 85%, a complete identification can be obtained; when the duty ratio is < 85%, a complete identification cannot be obtained, and the incomplete identification trace is generally located at the beginning of the identification. This is because the green nanosecond laser is a long pulse laser with low energy density, and it is difficult for the electrons bound by the material atoms to become free electrons under its laser irradiation, so it cannot cause the avalanche ionization mechanism to identify the high boron silicon label [7][8]. However, in the actual production process of glass, due to impurities in the material or surface / sub surface micro cracks, scratches and other defects, the center of laser absorption is formed, resulting in the decrease of material damage threshold and material damage.…”

Section: Fig 4 Identification Morphology At Different Duty Ratiosmentioning

confidence: 99%

Research of glass marking process based on the 532 nm wavelength laser

Chen

Zhang

2022

Seventeenth National Conference on Laser Technology and Optoelectronics

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High borosilicate glass has the advantages of high light transmittance, good mechanical performance, chemical stability and thermal stability. It is widely used in daily use, chemistry, architecture, electronics, instruments and other fields. There is a large number of identification requirements in the application. In this paper, based on the 532nm wavelength laser, the marking process of high borosilicate glass is studied. The influence rule and mechanism of duty ratio, repetition frequency, marking speed and defocus amount on the marking effect are explored by single factor control variable method. The research results show that the four process parameters have an important impact on the integrity of the identification profile. Through the optimization of the process parameters, the process window of 532nm wavelength laser identification of high borosilicate glass is obtained, which realizes the good identification effect of the identification morphology and provides a reference for the green light identification of high borosilicate glass.

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Section: Fig 4 Identification Morphology At Different Duty Ratiosmentioning

confidence: 99%