Research of glass marking process based on the 532 nm wavelength laser

Abstract

High borosilicate glass has the advantages of high light transmittance, good mechanical performance, chemical stability and thermal stability. It is widely used in daily use, chemistry, architecture, electronics, instruments and other fields. There is a large number of identification requirements in the application. In this paper, based on the 532nm wavelength laser, the marking process of high borosilicate glass is studied. The influence rule and mechanism of duty ratio, repetition frequency, marking speed and defocus amount on the marking effect are explored by single factor control variable method. The research results show that the four process parameters have an important impact on the integrity of the identification profile. Through the optimization of the process parameters, the process window of 532nm wavelength laser identification of high borosilicate glass is obtained, which realizes the good identification effect of the identification morphology and provides a reference for the green light identification of high borosilicate glass.