A new type of nanoscale reference grating manufactured by combined laser-focused atomic deposition and x-ray interference lithography and its use for calibrating a scanning electron microscope

Xiao, Deng; Dai, Gaoliang; Liu, Jie; Hu, Xiukun; Bergmann, Detlef; Zhao, Jun; Tai, Renzhong; Cai, Xiaoyu; Li, Yuan; Li, Tongbao; Cheng, Xinbin

doi:10.1016/j.ultramic.2021.113293

Cited by 15 publications

(11 citation statements)

References 10 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Soft X-rays are used (140-500 eV) as they provide a good trade-off between the diffraction-limited resolution and photoelectron-blur/penumbral limited resolution (Reznikova et al, 2008). Deng et al (Deng et al, 2021) fabricated a nanoscale reference grating having a nonlinear deviation below ±0.5 nm and a maximum variation in calibrated mean pitch 0.01 nm using a combination of laser-focused atomic deposition and XIL. Mojarad et al (Mojarad et al, 2021) obtained nanopillars with a high aspect ratio and variable opening diameter (40-100 nm) as a function of exposure dose, using 4-beam XIL and electroplating, as shown in Figure 2A.…”

Section: X-ray Interference Lithographymentioning

confidence: 99%

X-Ray Lithography for Nanofabrication: Is There a Future?

Bharti

Turchet

Marmiroli

2022

Front. Nanotechnol.

View full text Add to dashboard Cite

X-ray lithography has been first proposed almost 50 years ago, and the related LIGA process around 25 years ago. It is therefore a good time to make an analysis of the technique, with its pros and cons. In this perspective article, we describe X-ray lithography’s latest advancements. First, we report the improvement in the fabrication of the high aspect ratio and high-resolution micro/nanostructures. Then, we present the radiation-assisted synthesis and processing of novel materials for the next generation of functional devices. We finally draw our conclusion on the future prospects of the technique.

show abstract

Section: X-ray Interference Lithographymentioning

confidence: 99%

X-Ray Lithography for Nanofabrication: Is There a Future?

Bharti

Turchet

Marmiroli

2022

Front. Nanotechnol.

View full text Add to dashboard Cite

show abstract

“…Many x-ray optical elements, such as x-ray refractive lenses [4], collimators [5], and diffraction gratings [6] are manufactured by this technique. Diffraction gratings in particular have found applications in many fields such as medicine, tomography, biology [7,8], and XRL has the potential to fabricate about 1 µm linewidth gratings [9].…”

Section: Introductionmentioning

confidence: 99%

Reflective x-ray masks for x-ray lithography

Chumak,

Peredkov,

Devizenko

et al. 2024

J. Micromech. Microeng.

View full text Add to dashboard Cite

Application of X-ray multilayers as reflective X-ray masks (RXMs) for X-ray lithography is proposed. The mask is a specially prepared multilayer mirror capable to selectively reflect X-rays. The use of grazing geometry allows a pattern design on the mask to be compressed in one direction. Application examples are given for the masks (WC/Si multilayers) with two types of a radiation source: an X-ray tube (λ=0.154 nm) and a synchrotron (λ~0.35 nm). The compression of the mask segments by 14-30 times with the imprint size in the resist plane 3.5-4 μm is obtained. The advantages of the proposed masks are given. The possibilities of obtaining submicron imprints are discussed.

show abstract

“…Calibrations of the grating pattern by a metrological large-range atomic force microscope (AFM) have indicated that the grating sample exhibits outstanding pattern uniformity. Therefore, it is very suitable to be used as a reference material for calibrating high-resolution microscopes for nanotechnology [16].…”

Section: Introductionmentioning

confidence: 99%

Linewidth characterization of a self-traceable grating by SEM

Guo,

Miao,

Mao

et al. 2024

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

In order to achieve high-precision nanometrology, a self-traceable grating reference material has been reported and prepared by atom lithography and soft X-ray interference techniques (J. Liu et al., Nanotechnology 32 (2021) 175301). In this work we employ a Monte Carlo simulation method to study the scanning electron microscopy (SEM) image contrast and linewidth characterization of the grating linewidth. The 3D structure of the mushroom-shaped grating line made of the multilayer (Pt, SiO2 and Si) is modeled according to the transmission electron microscopy (TEM) image, enabling the SEM linescan profiles of secondary electron signals to be obtained for different values of structural linewidth parameter from Monte Carlo simulations. In the light of the principle of the model-based library method a model database of Monte Carlo simulated SEM linescan profiles by varying the incident electron beam conditions and the grating linewidths is thus constructed; then the grating linewidth has been successfully characterized with experimental SEM image. By comparison with the TEM measurement, the measurement accuracy is verified to within 0.3% for the linewidth of ~25 nm.

show abstract

A new type of nanoscale reference grating manufactured by combined laser-focused atomic deposition and x-ray interference lithography and its use for calibrating a scanning electron microscope

Cited by 15 publications

References 10 publications

X-Ray Lithography for Nanofabrication: Is There a Future?

X-Ray Lithography for Nanofabrication: Is There a Future?

Reflective x-ray masks for x-ray lithography

Linewidth characterization of a self-traceable grating by SEM

Contact Info

Product

Resources

About