2001
DOI: 10.1016/s0168-9002(01)00385-0
|View full text |Cite
|
Sign up to set email alerts
|

30Mrad(SiO2) radiation tolerant pixel front end for the BTEV experiment

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
10
0

Year Published

2001
2001
2014
2014

Publication Types

Select...
5
3

Relationship

0
8

Authors

Journals

citations
Cited by 26 publications
(10 citation statements)
references
References 4 publications
0
10
0
Order By: Relevance
“…The reason for this behaviour is that as the oxide thickness decreases, and in addition to thermal annealing, tunneling becomes possible and more effective at neutralizing radiation-induced charge. Deep submicron processes are, therefore, attractive for the design of ASIC's for experiments which involve pions, protons and other charged hadrons and neutrons [1][2][3]. However, using standard transistors and due to positive charge trapping that accumulates -------------------------------- of the device with external voltages applied is shown in Figure 1(b), where the origin of the axis of coordinates that we will consider in this analysis is taken at the centre of the inner diffusion and V GB , V DB and V SB are the gate, drain and source to bulk voltages, respectively.…”
Section: Introductionmentioning
confidence: 99%
“…The reason for this behaviour is that as the oxide thickness decreases, and in addition to thermal annealing, tunneling becomes possible and more effective at neutralizing radiation-induced charge. Deep submicron processes are, therefore, attractive for the design of ASIC's for experiments which involve pions, protons and other charged hadrons and neutrons [1][2][3]. However, using standard transistors and due to positive charge trapping that accumulates -------------------------------- of the device with external voltages applied is shown in Figure 1(b), where the origin of the axis of coordinates that we will consider in this analysis is taken at the centre of the inner diffusion and V GB , V DB and V SB are the gate, drain and source to bulk voltages, respectively.…”
Section: Introductionmentioning
confidence: 99%
“…An ACcoupled amplifier further increases the analogue signal. Ultimately, a group of several discriminators form a flash ADC, providing over-threshold information and pulse-height digitization [7], [8].…”
Section: A Introductionmentioning
confidence: 99%
“…In the following subsections we will concentrate on two readout chips for photon counting hybrid pixel detectors fabricated as a result of the efforts of the Medipix collaboration [44]. These are by no means the only devices of this type being developed in the world, and more information on other hybrid pixel detector systems can be found in e.g.…”
Section: Photon Counting Hybrid Pixel Detectorsmentioning
confidence: 99%
“…For example, the FPIX chip [44] to be used in the BTeV experiment in Fermilab uses a 3-bit flash ADC, and the readout chip for the pixel detector in the ATLAS Experiment [45] at CERN uses the Time Over Threshold technique [46] to determine the deposited energy. However, the application as well as the architecture of these chips are very different from the spectroscopic quantum imaging system described in this thesis.…”
Section: Pixel-level Analog-to-digital Convertersmentioning
confidence: 99%