“…The reason for this behaviour is that as the oxide thickness decreases, and in addition to thermal annealing, tunneling becomes possible and more effective at neutralizing radiation-induced charge. Deep submicron processes are, therefore, attractive for the design of ASIC's for experiments which involve pions, protons and other charged hadrons and neutrons [1][2][3]. However, using standard transistors and due to positive charge trapping that accumulates -------------------------------- of the device with external voltages applied is shown in Figure 1(b), where the origin of the axis of coordinates that we will consider in this analysis is taken at the centre of the inner diffusion and V GB , V DB and V SB are the gate, drain and source to bulk voltages, respectively.…”