2016
DOI: 10.1002/smll.201602250
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Scalable Fabrication of Multiplexed Plasmonic Nanoparticle Structures Based on AFM Lithography

Abstract: A controllable and scalable strategy is developed to fabricate multiplexed plasmonic nanoparticle structures by mechanical scratching with AFM lithography, which exhibit multiplex plasmonic properties and surface-enhanced Raman scattering responses. It offers an intuitive way to explore the plasmonic effects on the performance of an organic light-emitting diode device integrating with multiplexed plasmonic nanostructures.

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Cited by 27 publications
(15 citation statements)
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References 61 publications
(76 reference statements)
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“…Thus, the multidipole system reproducibly arranges itself to reach an electrostatic equilibrium, keeping the energy of the system at the minimum level. Future study of this effect is warranted (including the potential influence of electrohydrodynamic flow), but we propose that the self‐assembly of beads into symmetric patterns may someday be useful for making photonic crystals or plasmonic structures …”
Section: Resultsmentioning
confidence: 99%
“…Thus, the multidipole system reproducibly arranges itself to reach an electrostatic equilibrium, keeping the energy of the system at the minimum level. Future study of this effect is warranted (including the potential influence of electrohydrodynamic flow), but we propose that the self‐assembly of beads into symmetric patterns may someday be useful for making photonic crystals or plasmonic structures …”
Section: Resultsmentioning
confidence: 99%
“…Thanks to the advances in nanofabrication technologies, these low‐cost, large‐area, and mass‐productive techniques have sped up the development of static metadevices and are gradually becoming mature. We believe that a variety of emerging techniques and clever designs can also be adopted for metasurfaces, such as scanning probe lithography, laser direct writing, laser‐induced forward transfer, the multilayer electroplating technique, multiphoton lithography, nanostencil lithography, phase‐shifting photolithography, shadow‐mask lithography etc. With the incorporation of functional materials, tunable or reconfigurable metasurfaces further bring more exciting and versatile functionalities for broader applications.…”
Section: Discussionmentioning
confidence: 99%
“…However, their high cost, complex preparation required accuracy and high time consumption limit their employment in potential applications . Thus, fully controlling the LSPR of different types of metal nanoparticles (size, shape, or composition) in a device using facile techniques that involve low equipment cost and high throughput, are crucial to intensively study and apply LSPR in devices …”
Section: Introductionmentioning
confidence: 99%