2014
DOI: 10.1002/j.2168-0159.2014.tb00072.x
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21.1: A 513‐ppi FFS‐Mode TFT‐LCD using CAAC Oxide Semiconductor Fabricated by a 6‐Mask Proces

Abstract: A driving method which does not need planarity for high definition and enables low frequency driving was examined. Further, a 513-ppi FFS-mode liquid crystal display (LCD) panel with high aperture ratio was fabricated via a six-mask process, using a technique that combines an oxide semiconductor and an oxide conductor.

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Cited by 9 publications
(4 citation statements)
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“…As described above, the control of the conductivity of IGZO thin films is very important and useful for many applications. 17 The change in resistance of OS films is attributed to the formation of donor states, but the physical origin of the major donor states in IGZO films remains subject to debate. Thus, to better understand the carrier generation mechanisms in OS thin films, we investigated the relationship between conductivity and the concentration of H and V O in the OS films by applying hard X-ray photoelectron spectroscopy (HXPES), secondary ion mass spectroscopy (SIMS), and thermal desorption spectroscopy (TDS), and discussed the relationship between carrier concentration estimated by Hall effect measurement and H concentration.…”
Section: Introductionmentioning
confidence: 99%
“…As described above, the control of the conductivity of IGZO thin films is very important and useful for many applications. 17 The change in resistance of OS films is attributed to the formation of donor states, but the physical origin of the major donor states in IGZO films remains subject to debate. Thus, to better understand the carrier generation mechanisms in OS thin films, we investigated the relationship between conductivity and the concentration of H and V O in the OS films by applying hard X-ray photoelectron spectroscopy (HXPES), secondary ion mass spectroscopy (SIMS), and thermal desorption spectroscopy (TDS), and discussed the relationship between carrier concentration estimated by Hall effect measurement and H concentration.…”
Section: Introductionmentioning
confidence: 99%
“…Accordingly, both low power consumption and high resolution can be achieved simultaneously [9]. Thus, we examined improvement of optical characteristics that remain problematic for visibility.…”
Section: L=3μmmentioning
confidence: 99%
“…In particular, we used a c-axis aligned crystalline oxide semiconductor (CAAC-OS) to fabricate highly reliable field-effect transistors (FETs) [10][11][12][13][14]. Employing bottom-gate top-contact (BGTC) CAAC-OS FETs, we fabricated 513-ppi transmissive liquid-crystal display (LCD) panels and 434-ppi reflective LCD panels [15][16][17][18].…”
Section: Introductionmentioning
confidence: 99%