2016
DOI: 10.1088/1674-1056/25/2/024204
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2-μm single longitudinal mode GaSb-based laterally coupled distributed feedback laser with regrowth-free shallow-etched gratings by interference lithography

Abstract: We report a type-I GaSb-based laterally coupled distributed-feedback (LC-DFB) laser with shallow-etched gratings operating a continuous wave at room temperature without re-growth process. Second-order Bragg gratings are fabricated alongside the ridge waveguide by interference lithography. Index-coupled LC-DFB laser with a cavity of 1500 µm achieves single longitudinal mode continuous-wave operation at 20 • C with side mode suppression ratio (SMSR) as high as 24 dB. The maximum single mode continuous-wave outpu… Show more

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Cited by 9 publications
(3 citation statements)
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“…Referring to the coupling principle of LC-DFB, it is well known that the proximity of the gratings to the ridge is a key factor that greatly influences the laser performance [ 20 ]. In the fabrication process, after the ridge waveguide is first defined, the sample for electron-beam lithography (EBL) has a height difference with respect to the waveguide, and the photoresist will stack aside the sidewall during EBL, which makes it difficult to make the formation of grating adjacent to the ridge.…”
Section: Methodsmentioning
confidence: 99%
“…Referring to the coupling principle of LC-DFB, it is well known that the proximity of the gratings to the ridge is a key factor that greatly influences the laser performance [ 20 ]. In the fabrication process, after the ridge waveguide is first defined, the sample for electron-beam lithography (EBL) has a height difference with respect to the waveguide, and the photoresist will stack aside the sidewall during EBL, which makes it difficult to make the formation of grating adjacent to the ridge.…”
Section: Methodsmentioning
confidence: 99%
“…The wafer then was processed into 2-mm-long, 100-µm-wide stripe chips with standard contact optical lithography in combination with etching process. [7] 250 nm SiO 2 was deposited to be used as insulation after the 2 µm ridge was etched. The wafer was thinned to 130 nm.…”
Section: Device Designmentioning
confidence: 99%
“…[1][2][3][4] Therefore, some applications can be served by optoelectronic devices operating in this band, such as environmental monitoring, free space communication, biotechnology, infrared radars, material processing, etc. [5][6][7] At present, a laser operating at 2 µm can be acquired by solid-state and fiber lasers doped with Tm 3+ and Ho 3+ and GaSb-based laser diodes. [8][9][10] The technology of the traditional semiconductor diode laser is quite mature, and is capable of generating high power laser output efficiently and reliably.…”
Section: Introductionmentioning
confidence: 99%