1D photonic crystal fabricated by wet etching of silicon

Tolmachev, V. A.; Astrova, E. V.; Pilyugina, J.A.; Perova, Tatiana S.; Moore, Robert A.; Vij, J. K.

doi:10.1016/j.optmat.2004.08.019

Cited by 57 publications

(47 citation statements)

References 15 publications

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“…15,16 However, Si is not transparent in the visible wavelength region. Therefore, 1D PhCs made of TiO 2 and Al 2 O 3 are desirable candidates for applications in the visible and near-infrared regimes.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of high aspect ratio TiO2 and Al2O3 nanogratings by atomic layer deposition

Shkondin¹,

Takayama²,

Lindhard³

et al. 2016

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Articles you may be interested inThe authors report on the fabrication of TiO 2 and Al 2 O 3 nanostructured gratings with an aspect ratio of up to 50. The gratings were made by a combination of atomic layer deposition (ALD) and dry etch techniques. The workflow included fabrication of a Si template using deep reactive ion etching followed by ALD of TiO 2 or Al 2 O 3 . Then, the template was etched away using SF 6 in an inductively coupled plasma tool, which resulted in the formation of isolated ALD coatings, thereby achieving high aspect ratio grating structures. SF 6 plasma removes silicon selectively without any observable influence on TiO 2 or Al 2 O 3 , thus revealing high selectivity throughout the fabrication. Scanning electron microscopy was used to analyze every fabrication step. Due to nonreleased stress in the ALD coatings, the top parts of the gratings were observed to bend inward as the Si template was removed, thus resulting in a gradual change in the pitch value of the structures. The pitch on top of the gratings is 400 nm, and it gradually reduces to 200 nm at the bottom. The form of the bending can be reshaped by Ar þ ion beam etching. The chemical purity of the ALD grown materials was analyzed by x-ray photoelectron spectroscopy. The approach presented opens the possibility to fabricate high quality optical metamaterials and functional nanostructures.

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Section: Introductionmentioning

confidence: 99%

Fabrication of high aspect ratio TiO2 and Al2O3 nanogratings by atomic layer deposition

Shkondin¹,

Takayama²,

Lindhard³

et al. 2016

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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“…However, numerous practical devices have been fabricated from 1-D PhC for optical communication and sensing systems (reflectors, filters, dispersion compensators), and many other functions are still to be exploited, nonlinear [3], superprism [4], slow light [5], and tunable properties [6]- [7] being some examples. As far as light guidance is concerned, in the plane normal to periodicity one can distinguish between in-variant material distribution (light is therefore unconfined, as in [8]), and boundary conditions that impose a transverse confinement (i.e. trenches throughout a slab waveguide [9], or fully etched Bragg gratings [10]).…”

Section: Introductionmentioning

confidence: 99%

“…However, very limited work has been devoted to wet etched PhC. Such studies most frequently focus on deep etching of (110) silicon, so that the resulting holes can be vertical [8]. In this paper we report the design and analysis of 1-D PhC fabricated by anisotropic wet etching of (100) silicon-on-insulator (SOI) wafers.…”

Section: Introductionmentioning

confidence: 99%

Tunable one-dimensional photonic crystal slabs based on preferential etching of silicon-on-insulator

Zografopoulos¹,

Kriezis²,

Bellini³

et al. 2007

Opt. Express

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Abstract:We design and assess a one-dimensional photonic crystal slab fabricated by preferential etching of a silicon-on-insulator substrate. The etched grooves are considered to be infiltrated by a highly-birefringent nematic liquid crystalline material. A detailed analysis of the nematic director response within the grooves is presented. We investigate different configurations and demonstrate large band gap shifting when switching the liquid crystal with an applied voltage. Furthermore, we assess this type of device as an efficient alternative for compact refractometric optical sensing applications. Hoekstra, and R.M. de Ridder, "Quasi-one-dimensional photonic crystal as a compact building-block for refratometric optical sensors," IEEE J. Sel. Top. Quantum Electron. 11, 11-16 (2005).

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“…3 (black curves), the final device should have a filling fraction f Ã Si ¼ 0:145 and, therefore, a final Si-wall thickness of d Si ¼f Ã Si ·a¼0:58μm. In order to fabricate the initial Si grooved structure, we used wet anisotropic etching of ð110Þ Si [9]. This process generates a mirrorlike quality for the Si sidewalls [10], which creates a very pronounced flattop band in the transmission spectrum T. The values of the thicknesses d Si and d ox were also optimized.…”

mentioning

confidence: 99%

“…Reflection and transmission spectra measurements were performed using a Bio-Rad (now Varian, USA) FTS 6000 Fourier transform IR spectrometer equipped with a UMA-500 IR microscope. The aperture of the focused beam was 15 × 15 μm 2 , and the spectral resolution was 8 cm −1 (as described in [9]). Figure 5 shows experimental R and T characteristics compared with the simulated spectra.…”

mentioning

confidence: 99%

Silicon photonic crystal filter with ultrawide passband characteristics

et al. 2011

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We report on what is believed to be the first example of an ultrawide, bandpass filter, based on a high-contrast multicomponent one-dimensional Si photonic crystal (PC). The effect of the disappearance of a limited number of flat stopbands and their replacement with extended passbands is demonstrated over a wide IR range. The passbands obtained exhibit a high transmission of 92% to 96% and a substantial bandwidth of 1800 nm, which is spectrally flat within the passband. The multicomponent PC model suggested can be applied to the design of any micro-or nanostructured semiconductor or dielectric material for application across a wide spectral range.

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1D photonic crystal fabricated by wet etching of silicon

Cited by 57 publications

References 15 publications

Fabrication of high aspect ratio TiO2 and Al2O3 nanogratings by atomic layer deposition

Fabrication of high aspect ratio TiO2 and Al2O3 nanogratings by atomic layer deposition

Tunable one-dimensional photonic crystal slabs based on preferential etching of silicon-on-insulator

Silicon photonic crystal filter with ultrawide passband characteristics

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