16‐2: <i>Distinguished Paper:</i> Thin and Low‐Reflection Metal Black Matrix for High PPI LCD

Yoshida, Keisuke; Ueda, Satoshi; Hachiya, Atsushi; Okada, Kuniaki; Hirai, Akira; Kawahira, Yuichi; Misaki, Katsunori; Furukawa, Hajime; Kato, Hiromi

doi:10.1002/sdtp.15445

Cited by 2 publications

(1 citation statement)

References 4 publications

(2 reference statements)

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“…At present, the preferred solution for glass-based ultra-high PPI is liquid crystal display (LCD) technology, because the LCD display has only one switch TFT in the pixel area, which is benefit to achieving high PPI [3][4][5]. However, VR is a near-eye display with high demand for backlight and transmittance, while LCD display requires two polarizer layers with low transmittance, the pixel design of backplane with high opening ratio is therefore a big challenge.…”

Section: Introductionmentioning

confidence: 99%

85‐2: 2117PPI VR LCD with ultra‐high aperture opening ratio

Zhou,

Zhang,

Wang

et al. 2023

Symp Digest of Tech Papers

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In this paper, the Pixel Design and the Process Technology of ultra‐high PPI display are investigated. For increasing the aperture open ratio in pixel design, the width of metal data line, the size of TFT and the crosstalk between metal lines are separately researched. The minimum of light shield for LTPS TFT is achieved since the mechanism between photoillumination and off‐state current is analyzed. In the meanwhile, the process of narrow metal lines and small via holes are developed. For conclusion, the aperture open ratio of backplane panel is achieved more than 55%.

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Section: Introductionmentioning

confidence: 99%

85‐2: 2117PPI VR LCD with ultra‐high aperture opening ratio

Zhou,

Zhang,

Wang

et al. 2023

Symp Digest of Tech Papers

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P‐13.7: Self‐alignment PS process and application in liquid crystal displays to achieve ultra high aperture ratio

Yu,

Yang,

et al. 2024

Symp Digest of Tech Papers

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In this paper, The self‐alignment process is used to realize the Metal+PS structure on the CF (Color Filter) substrate, which can further reduce the size of PS, Photo Spacer; At the same time, Metal can shield the light leakage of PS, because the alignment deviation between BM and PS can be eliminated through the self‐aligning process, so the size of the BM (Black martrix) can be reduced. The application in high ppi LCD products can maximize the aperture ratio of the device. Through the process scheme in this paper, the self‐aligned PS structure of PS can be achieved (CD (Critical Dimension) ≈ 1um, Profile ≈90°), and the unilateral shileding distance is > 2.0um. In 2000PPI products, Apeture Ratio of panel increases to about 40% (conventional circular main+sub PS solution, AR of panel was only about 25%).

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16‐2: Distinguished Paper: Thin and Low‐Reflection Metal Black Matrix for High PPI LCD

Cited by 2 publications

References 4 publications

85‐2: 2117PPI VR LCD with ultra‐high aperture opening ratio

85‐2: 2117PPI VR LCD with ultra‐high aperture opening ratio

P‐13.7: Self‐alignment PS process and application in liquid crystal displays to achieve ultra high aperture ratio

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