P‐13.7: Self‐alignment PS process and application in liquid crystal displays to achieve ultra high aperture ratio

Abstract

In this paper, The self‐alignment process is used to realize the Metal+PS structure on the CF (Color Filter) substrate, which can further reduce the size of PS, Photo Spacer; At the same time, Metal can shield the light leakage of PS, because the alignment deviation between BM and PS can be eliminated through the self‐aligning process, so the size of the BM (Black martrix) can be reduced. The application in high ppi LCD products can maximize the aperture ratio of the device. Through the process scheme in this paper, the self‐aligned PS structure of PS can be achieved (CD (Critical Dimension) ≈ 1um, Profile ≈90°), and the unilateral shileding distance is > 2.0um. In 2000PPI products, Apeture Ratio of panel increases to about 40% (conventional circular main+sub PS solution, AR of panel was only about 25%).