2017
DOI: 10.1590/1980-5373-mr-2016-0728
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Temperature and Deposition Time Effect on Properties and Kinetics of CdSe and CdS0.25Se0.75 Films Deposited by CBD

Abstract: CdSe and CdS 0.25 Se 0.75 thin films were grown by the Chemical Bath Deposition technique at different temperatures (50-90°C) and deposition times (5-180 min). Both kinds of films are polycrystalline, constituted by nanostructured clusters of particles. CdSe films consist in a mixture of cubic and hexagonal phases (4-8 nm crystal size), whereas only the hexagonal phase is observed in the CdS 0.25 Se 0.75 ones (6±1 nm crystal size). A decrease on the CdSe films density was observed due to the sulfur introductio… Show more

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Cited by 5 publications
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“…Electrical and optical properties of semiconducting thin films are vital requirements for appropriate applications in several optoelectronic devices [11,12]. Modifying the composition of the ternary CdSe1-xSx thin films permits improvement of electrical, optical and structural properties of the binary CdSe thin films, therefore; widening of its scientific and technological applications [13]. Nano-sized CdSe1-xSx thin films can be prepared by several chemical and physical methods such as chemical bath deposition (CBD), chemical vapor deposition (CVD), RF-sputtering, spray pyrolysis, laser ablation and thermal evaporation techniques [13][14][15][16].…”
Section: Introductionmentioning
confidence: 99%
“…Electrical and optical properties of semiconducting thin films are vital requirements for appropriate applications in several optoelectronic devices [11,12]. Modifying the composition of the ternary CdSe1-xSx thin films permits improvement of electrical, optical and structural properties of the binary CdSe thin films, therefore; widening of its scientific and technological applications [13]. Nano-sized CdSe1-xSx thin films can be prepared by several chemical and physical methods such as chemical bath deposition (CBD), chemical vapor deposition (CVD), RF-sputtering, spray pyrolysis, laser ablation and thermal evaporation techniques [13][14][15][16].…”
Section: Introductionmentioning
confidence: 99%