2015
DOI: 10.1590/1516-1439.002715
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Boron Doped Ultrananocrystalline Diamond Films on Porous Silicon: Morphological, Structural and Electrochemical Characterizations

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Cited by 9 publications
(2 citation statements)
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“…The bottom-up overgrowth methods make use of a nanostructured template, over which the diamond is grown. These templates include silicon nanowires ( Gao et al, 2015 ; Gund et al, 2015 ), porous silicon ( Ferreira et al, 2005 ; Silva et al, 2015 ), ‘black’ silicon ( May et al, 2016 ), silica fibers ( Petrák et al, 2017 ; Vlčková Živcová et al, 2018 ), silica nanospheres ( Gao et al, 2014 ), anodized aluminum oxide (AAO) ( Masuda et al, 2001 ; Aramesh et al, 2014 ), and quartz fibers ( Kondo et al, 2009 ). The annealing method applies a high temperature to the diamond in vacuum or an atmosphere of air, pure oxygen, or steam.…”
Section: Current Experimental Progress Of Diamond Supercapacitorsmentioning
confidence: 99%
“…The bottom-up overgrowth methods make use of a nanostructured template, over which the diamond is grown. These templates include silicon nanowires ( Gao et al, 2015 ; Gund et al, 2015 ), porous silicon ( Ferreira et al, 2005 ; Silva et al, 2015 ), ‘black’ silicon ( May et al, 2016 ), silica fibers ( Petrák et al, 2017 ; Vlčková Živcová et al, 2018 ), silica nanospheres ( Gao et al, 2014 ), anodized aluminum oxide (AAO) ( Masuda et al, 2001 ; Aramesh et al, 2014 ), and quartz fibers ( Kondo et al, 2009 ). The annealing method applies a high temperature to the diamond in vacuum or an atmosphere of air, pure oxygen, or steam.…”
Section: Current Experimental Progress Of Diamond Supercapacitorsmentioning
confidence: 99%
“…The main technique used for the deposition of a boron-doped diamond (BDD) film on a conductive substrate is hot filament (HFCVD) or microwave plasma-assisted chemical vapor deposition (MPCVD). The current bottom-up methods focus on overgrown CVD-BDD films on already porous substrates, at moderate temperatures (450−600 °C), such as SiO 2 nanofibers 8 and microspheres, 9 porous silicon substrate, 10 carbon nanotubes, 11 and copper and tungsten foams. 12 On the other hand, the main strategy of top-down methods is to use reactive ions or radicals to promote the surface etching of a BDD film.…”
Section: ■ Introductionmentioning
confidence: 99%