The photochemical modifications induced in the UV ablation of molecular substrates are examined in model systems of polymer films (PMMA) doped with a highly photosensitive organic pigment (1-iodonaphthalene). Ablation by nanosecond laser pulses at 248 nm is shown to result in an increase of photolysis yields and in the efficient formation of new products. In sharp contrast, photoproduct formation in the corresponding ablation with 500 fs pulses is well defined and limited. Thus, besides its well-acknowledged thermal advantage, fs ablation is shown to provide a high degree of control over the induced photochemical modifications. The results of the study are correlated with the specific procedures that have been defined for the efficient restoration of painted surfaces with minimal photochemical modification to the substrate. PACS: 42.60; 82.65 UV laser ablation constitutes the basis of a number of diverse techniques aiming at the analysis and material processing of molecular substrates [1][2][3]. In a rather unconventional extension of these implementations, we have demonstrated [4,5] the potential of excimer laser ablation for the restoration of painted artworks. This approach has been shown to overcome the limitations of conventional restoration methods and to enable successful treatment of demanding problems that are otherwise difficult or even not amenable to the traditional techniques.The restoration of painted artworks focuses largely, though not exclusively, on the removal of degraded superficial varnish layers that cover the painting's surface [6]. Varnish is a mixture of cyclic organic substances [7] and is applied to paintings for aesthetic (enhancing the painting's colour appearance) and protective (preventing direct exposure of the painted surface to the environment) purposes. With time, it polymerizes and undergoes photooxidation at its outer layers, with detrimental effects on the artwork's appearance and even for its long-term integrity. This necessitates removal of the degraded varnish layers without, of course, compromising the integrity and the authenticity of the original painted surface.Varnish absorbs strongly in the UV [9], which suggests its efficient etching by excimer laser irradiation with minimal light penetration to the sublayers. Indeed, initial studies [4,8] demonstrated that degraded surface layers 20-100 µm thick can be etched by ablation at 248 nm with a resolution of 0.1-1 µm/pulse. Thus, the excimer-laser-based procedure meets the restoration needs by effecting removal of the degraded varnish in a controlled, highly selective and welldefined manner. A further advantage for the laser-based approach accrues from the possibility of on-line control of the procedure through interfacing with a variety of in-situ laserbased analytical techniques [5].Although the potential of the procedure has been established, it is critical to assess the short-and long-term effects on the integrity of the substrate. In particular, the fact that conditions of relatively strong irradiation are employed f...