1996
DOI: 10.1063/1.50886
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1/f noise in metallic thin films

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Cited by 8 publications
(3 citation statements)
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“…The exponent α could not be related to other parameters. Its distribution had a maximum at values slightly below 1, which confirms earlier findings on large ensembles of thin film resistors from multiple manufacturers [25] [26]. The suitability of NI as a quantitative indicator should be carefully considered for parts where α deviates strongly from unity and where the noise power is no longer equal per log unit of frequency bandwidth [23].…”
Section: Discussionsupporting
confidence: 81%
“…The exponent α could not be related to other parameters. Its distribution had a maximum at values slightly below 1, which confirms earlier findings on large ensembles of thin film resistors from multiple manufacturers [25] [26]. The suitability of NI as a quantitative indicator should be carefully considered for parts where α deviates strongly from unity and where the noise power is no longer equal per log unit of frequency bandwidth [23].…”
Section: Discussionsupporting
confidence: 81%
“…Noise spectroscopy and I-V characteristic non-linearity measurements are proposed as a diagnostic tool in order to characterize the sample bulk and contact quality, and to predict the mode of possible contact failure [14,15]. These are sensitive techniques for analysis of bulk and interface defects for determining the quality of devices.…”
Section: Introductionmentioning
confidence: 99%
“…Some of the methods are used in different production stages [1][2][3], other during exploitation [4,5] or in a laboratory only [6] but still there are no universal methods which could be applied for cheap and widespread varistor quality monitoring in their work. The pros and cons of these methods as well as their further development will be described.…”
Section: Introductionmentioning
confidence: 99%