0.7-NA DUV step-and-scan system for 150-nm imaging with improved overlay

Schoot, Jan B. van; Bornebroek, Frank; Suddendorf, M. B.; Mulder, Melchior; Spek, Jeroen van der; Stoeten, Jan; Hunter, Adolph; Ruemmer, Peter

doi:10.1117/12.354357

“…All experiments are performed on PAS 5500/700 and PAS 5500/750E Step & Scan system with a maximum NA of 0.70 and an AERIAL II TM illuminator [5]. As photo resist Shinetsu SEPR 463 was used according to the conditions given in table 2.…”

Section: Methodsmentioning

confidence: 99%

Printing 130-nm DRAM isolation pattern: Zernike correlation and tool improvement

Schoot

¹

,

Seong

²

,

Geh

³

et al. 2001

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Exaggerated anticipatory anxiety is common in social anxiety disorder (SAD). Neuroimaging studies have revealed altered neural activity in response to social stimuli in SAD, but fewer studies have examined neural activity during anticipation of feared social stimuli in SAD. The current study examined the time course and magnitude of activity in threat processing brain regions during speech anticipation in socially anxious individuals and healthy controls (HC). Method Participants (SAD n = 58; HC n = 16) underwent functional magnetic resonance imaging (fMRI) during which they completed a 90s control anticipation task and 90s speech anticipation task.

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“…In current step and scan systems the wafer coordinates in the wafer plane are determined prior to exposure, using fiducial markers on the wafer stage as a reference 5 . These fiducial markers are then aligned to the reticle and during the actual exposure the positional information is used to 'blindly' step to the required position without further measurements on the wafer.…”

Section: Measurement Position Expose Positionmentioning

confidence: 99%

“…At the measurement position, the position of the wafer relative to two reference markers on the wafer stage is determined by means of the ATHENA™ alignment system with two colors and seven diffraction orders 5 . The reference markers on the wafer stage are located on two TIS plates (TIS plate 1 and TIS plate 2, see Figure 6) that are located on diagonal positions on the wafer stage.…”

Section: Wafer Alignmentmentioning

confidence: 99%

Performance results of a new generation of 300-mm lithography systems

Sluijk

¹

,

Castenmiller

²

,

Jongh

³

et al. 2001

Get access via publisher Add to dashboard Cite

Exaggerated anticipatory anxiety is common in social anxiety disorder (SAD). Neuroimaging studies have revealed altered neural activity in response to social stimuli in SAD, but fewer studies have examined neural activity during anticipation of feared social stimuli in SAD. The current study examined the time course and magnitude of activity in threat processing brain regions during speech anticipation in socially anxious individuals and healthy controls (HC). Method Participants (SAD n = 58; HC n = 16) underwent functional magnetic resonance imaging (fMRI) during which they completed a 90s control anticipation task and 90s speech anticipation task.

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“…Compared with other methods, machine vision based alignment has many advantages, such as high precision, process intuitive, simple structure, and high efficiency [1][2][3][4][5][6] . Therefore, it has been widely used in many applications including in optical lithography tools.…”

Section: Introductionmentioning

confidence: 99%

Automatic alignment system for optical lithography based on machine vision

Huang

¹

,

Liu

²

,

Yi

³

et al. 2009

SPIE Proceedings

0

Get access via publisher Add to dashboard Cite

Exaggerated anticipatory anxiety is common in social anxiety disorder (SAD). Neuroimaging studies have revealed altered neural activity in response to social stimuli in SAD, but fewer studies have examined neural activity during anticipation of feared social stimuli in SAD. The current study examined the time course and magnitude of activity in threat processing brain regions during speech anticipation in socially anxious individuals and healthy controls (HC). Method Participants (SAD n = 58; HC n = 16) underwent functional magnetic resonance imaging (fMRI) during which they completed a 90s control anticipation task and 90s speech anticipation task.

show abstract

0.7-NA DUV step-and-scan system for 150-nm imaging with improved overlay

Cited by 6 publications

References 9 publications

Printing 130-nm DRAM isolation pattern: Zernike correlation and tool improvement

Printing 130-nm DRAM isolation pattern: Zernike correlation and tool improvement

Performance results of a new generation of 300-mm lithography systems

Automatic alignment system for optical lithography based on machine vision

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