0.33 NA EUV systems for high-volume manufacturing

The pellicle plays a crucial role in the extreme ultraviolet (EUV) photolithography process and has garnered increased attention from advanced semiconductor manufacturers as they strive to advance development for smaller process nodes. Carbon nanotubes (CNTs) are highly promising for EUV pellicle applications due to their exceptional mechanical, thermal, and optical properties. It is necessary for the pellicle to be durable and robust enough to withstand extreme scanner conditions, which involve combinations of high temperatures and active hydrogen species generated by EUV light.In this study, we present test results conducted to simulate the environment of the next-generation 600W scanner using the NewSUBARU synchrotron light source facility. Our investigation focused on evaluating the performance of CNT films, both with and without protective coating layers. Surprisingly, the results indicate that the CNT film without coating demonstrated the most promising characteristics for pellicle applications, showcasing superior performance in the demanding EUV scanner environment.

Section: Introductionmentioning

confidence: 99%

EUV durability of CNT pellicles for next-generation scanner

Ueda,

Lima,

Harada

et al. 2024

“…As all advanced semiconductor manufacturers plan to utilize the extreme ultraviolet (EUV) lithography process by 2024, the competition to develop compact and high-performing semiconductor devices has increased in recent years. [1][2][3] Among all manufacturers the same goal is pursued: the utilization of an EUV light source to improve the resolution of the lithography process. The pellicle is one of the key components of the lithography process.…”

Section: Introductionmentioning

confidence: 99%

CNT-based pellicles for the next generation of EUV scanners

Ueda¹,

Lima²,

Harada

et al. 2023

There has been growing interest among advanced semiconductor manufacturers in pellicles that can withstand conditions in extreme ultraviolet (EUV) photolithography. The pellicle must have high mechanical toughness, high transparency in EUV radiation, thermal stability, and chemical stability for ionized and atomic hydrogen. For the above expectations, our experience shows that the carbon nanotube (CNT) yields the most promising results due to its outstanding mechanical and thermal properties. We are developing thin, free-standing CNT films for EUV pellicle application using a liquid filtration manufacturing method. This method has the advantage of producing highly uniform films, allowing us to use a variety of CNT types, while avoiding the use of harsh chemicals. To advance our hypothesis, we will examine and discuss EUV radiation durability results evaluated with the NewSUBARU synchrotron light facility.

“…Ultrafine and precise patterning in semiconductor manufacturing is expected to continue to progress with the sophistication of extreme ultraviolet (EUV) lithography. [1][2][3][4] Chemically amplified resists (CARs) have been used for a couple of decades in advanced semiconductor manufacturing processes because of their ability to maintain both high sensitivity and resolution by acid-catalyzed reaction. 5,6) Meanwhile, developing a resist molecular design for realizing single-nanometer patterning for the mass production of semiconductor devices is an important issue.…”

Section: Introductionmentioning

confidence: 99%

Study on deprotonation from radiation-induced ionized acrylate polymers including acid-generation promoters for improving chemically amplified resists

Okamoto

Konda

Ishimaru

et al. 2022

The demand for improved performance of chemically amplified resists (CARs) is continually increasing with the development of extreme ultraviolet lithography. Acid-generation promoters (AGPs) increase the sensitivity of CARs by increasing the initial acid yield immediately after the exposure process. However, the detailed mechanism of acid-yield enhancement has not been clarified yet. Deprotonation from the ionized polymer (i.e., radical cations) is an important reaction to assess acid generation. In this study, we investigated the dynamics of the radical cations of methacrylate polymers and the effect of an AGP on deprotonation from the radical cations formed by ionizing radiation. We clarified that the promotion of deprotonation by the AGP is more effective for the polymer with lower deprotonation efficiency. In addition, a molecular-level approach using density functional theory and molecular dynamics calculations were carried out.