EUV durability of CNT pellicles for next-generation scanner
Takahiro Ueda,
Marcio D. Lima,
Tetsuo Harada
et al.
Abstract:The pellicle plays a crucial role in the extreme ultraviolet (EUV) photolithography process and has garnered increased attention from advanced semiconductor manufacturers as they strive to advance development for smaller process nodes. Carbon nanotubes (CNTs) are highly promising for EUV pellicle applications due to their exceptional mechanical, thermal, and optical properties. It is necessary for the pellicle to be durable and robust enough to withstand extreme scanner conditions, which involve combinations o… Show more
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