Promising wavelengths for next-generation lithography with a wavelength shorter than 13.5 nm based on a synchrotron X-ray source are discussed. Theoretical and experimental values of the reflection coefficients of multilayer X-ray mirrors providing the maximum reflectivity in the range of 11.4-3.1 nm are presented. The theoretical efficiency of multilayer optics is compared for different wavelengths.
The results of studies of Ru/Sr multilayer mirrors optimized for the working wavelength range of 9-12 nm are presented in the paper. Within the framework of the presented article the strontium based multilayer structures with stable over time reflective characteristics were obtained for the first time. It is shown that Ru/Sr mirrors have the highest reflectance of all known reflective coatings, with the exception of beryllium-containing, in the spectral range of 9-12 nm.
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