Using direct laser lithography and liquid etching of polished vicinal Si(111) wafers, a technology was developed and diffraction gratings 500 /mm with a blaze angle of 4° were fabricated. The manufacturing process of a reflective Si-grating of a triangular profile (sawtooth) can be divided into four main steps: (1) obtaining a pattern of a protective mask for etching grooves; (2) anisotropic etching of grooves in KOH solution; (3) etching to smooth the grating profile and polish the surface of working facets; (4) coating to increase reflectivity. The samples obtained were characterized using scanning electron microscopy and atomic force microscopy methods to determine the shape of the groove profile and roughness: the shape turned out to be close to the ideal triangular, and the root-mean square roughness was less than 0.3 nm. With the help of the PCGrate™ code, taking into account the measured real groove profile, the diffraction efficiency of gratings operating in classical and conical mounts in soft-X-ray and extreme ultraviolet radiation has been simulated. The obtained efficiency values are close to the record ones for the corresponding spectral range and the Au-coating of the grating.
Anisotropic wet etching of vicinal single-crystallyne Si (111)4° wafers was used to obtain blazed gratings with high efficiency for soft X-ray (SXR) and extreme ultraviolet (EUV) applications. An improved experimental technology for the fabrication of triangular Si gratings, both medium frequency (250 and 500 mm-1) and high-frequency 2500 mm-1, is presented. The stages of a Cr mask formation for grooves etching, removing Si protrusions in order to smooth the profile, and polishing the surface to reduce nanoroughness are optimized. This work describes the method for simultaneous (in one process) obtaining a smoothed triangular profile of the Si grating and a polished surface of grooves by wet etching.
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