Cu 6 PS 5 I-based thin films deposited by magnetron sputtering were irradiated using wideband radiation of Cu-anode X-ray tube at different exposition times. Optical transmission spectra, Urbach absorption edge, and dispersion of refractive index for X-ray irradiated Cu 5.6 P 1.7 S 4.9 I 0.8 , Cu 6.4 P 1.1 S 4.6 I 0.9 and Cu 8.0 P 0.7 S 3.6 I 0.7 thin films were studied. The decrease of energy pseudogap and increase of refractive index with increase of X-ray irradiation time is observed.
Cu7GeS5I thin films were deposited by non-reactive radio frequency magnetron sputtering onto silicate glass substrates. Optical transmission spectra of X-ray irradiated Cu7GeS5I thin films were measured depending on irradiation time. With irradiation time increase the red shift of the shortwavelengt part of transmission spectra and interference maxima were observed. Urbach absorption edge and dispersion of refractive index for X-ray irradiated Cu7GeS5I thin films were studied. Under the influence of the X-ray irradiation the decrease of the energy position of absorption edge as well as the increase of the Urbach energy and refractive index were revealed. Influence of X-ray irradiation on the optical parameters and disordering processes in Cu7GeS5I thin films was analysed.
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