In the present work, the electrodeposition of iron-nickel-molybdenum (Fe-Ni-Mo) alloy on n-type silicon (Si) is investigated. A voltamperometric study has been carried out. According to the composition of the solution and of its pH, the properties of final deposit have been investigated and analyzed by X-rays diffraction (XRD), scanning electron microscopy (SEM) and energy dispersive X-ray spectroscopy (EDS). Under our conditions an amorphous FeNiMo alloy was formed. The morphology of deposited layer was strongly influenced by the polarization and the molybdenum dominance in the final chemical composition of the deposited film. Moreover, high percentages of molybdenum can be obtained from high molybdate concentrations and grain size increase with increasing Mo concentration. We also noticed that an absence of nickel was accomplished by applying more negative potential.
Co, CoNi and CoFeNi layers were formed on n-type silicon by electrodeposition method from sulfate solutions. The obtained films were characterized by Cyclic Voltammetry (CV), Scanning Electron Microscopy (SEM) and Energy Dispersive Spectrometry (EDS). The results show that the morphology and the stoechiometry of CoNi and CoNiFe deposits depend on several parameters (bath composition, applied potential…). The addition of sodium acetate as complexion agent in the bath leads to the formation of highly compacted and smooth films with a good adherence to the substrate.
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