In
this work, antimony sulfide (Sb2S3) thin
films were prepared by low-temperature plasma (about 190 °C)
sulfidation of antimony metal layers, and the sulfidation mechanism
was investigated. Solid sulfur powder was used as the sulfur source,
and the reaction process did not exhaust toxic gases. The relevant
process parameters, including the reaction pressure, radio frequency
(RF) power, and sulfurization time, were also optimized. Under conditions
of an RF power of 180 W (approximately 190 °C), a curing time
of 60 min, and a working pressure of 30 Pa, we prepared a smooth,
pinhole-free, (211) preferentially oriented Sb2S3 thin film. The film obtained good photocurrent response and a suitable
band gap of 1.74 eV. The properties and structures of the Sb2S3 thin film were characterized by optical emission spectroscopy,
high-resolution scanning electron microscopy, energy-dispersive spectroscopy,
X-ray diffraction, X-ray photoelectron spectroscopy, and UV and Raman
spectroscopies.
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