Due to the continuing improvements in camera technology, a high-resolution CMOS image sensor is required. However, a high-resolution camera requires that the pixel pitch is smaller than 1.0 μm in the limited sensor area. Accordingly, the optical performance of the pixel deteriorates with the aspect ratio. If the pixel depth is shallow, the aspect ratio is enhanced. Also, optical performance can improve if the sensitivity in the long wavelengths is guaranteed. In this current work, we propose a front-inner lens structure that enhances the sensitivity to the small pixel size and the shallow pixel depth. The front-inner lens was located on the front side of the backside illuminated pixel for enhancement of the absorption. The proposed structures in the 1.0 μm pixel pitch were investigated with 3D optical simulation. The pixel depths were 3.0, 2.0, and 1.0 μm. The materials of the front-inner lens were varied, including air and magnesium fluoride (MgF2). For analysis of the sensitivity enhancement, we compared the typical pixel with the suggested pixel and confirmed that the absorption rate of the suggested pixel was improved by a maximum of 7.27%, 10.47%, and 29.28% for 3.0, 2.0, and 1.0 μm pixel depths, respectively.
Reducing performance verification time is significant in product launch and production costs. This is especially true because aligning the optical stacks of off-axis pixels is a time-consuming task, but it is important to maintain sensitivity. In this paper, a numerical method to align the optical stacks of off-axis pixels is suggested in order to reduce performance test time. The components of the numerical method are the optical stack height, refractive index, and chief ray angle in order to calculate the optical stacks’ optimal shift distance. The proposed method was investigated to confirm effectiveness by using optical simulation. The sub-micron backside illumination (BSI) pixels were simulated, having 2 × 2 microlens, quad-color filter array, and in-pixel deep trench isolation (DTI). Moreover, the proposed method was evaluated for various pixel pitches, microlens shapes, and CRAs. As a result, the optical stacks were optimized by using the numerical method and validated via optical simulation. Therefore, the proposed numerical method is expected to help reduce the time and cost.
A covered microlens structure is suggested for high sensitivity of CMOS image sensor with quad color filter (CF) array. We confirmed that the sensitivity of the suggested structure was increased by an optical simulation.
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