Heterogeneous interfaces exhibit the unique phenomena by the redistribution of charged species to equilibrate the chemical potentials. Despite recent studies on the electronic charge accumulation across chemically inert interfaces, the systematic research to investigate massive reconfiguration of charged ions has been limited in heterostructures with chemically reacting interfaces so far. Here, we demonstrate that a chemical potential mismatch controls oxygen ionic transport across TiO 2 /VO 2 interfaces, and that this directional transport unprecedentedly stabilizes high-quality rutile TiO 2 epitaxial films at the lowest temperature (≤ 150°C) ever reported, at which rutile phase is difficult to be crystallized. Comprehensive characterizations reveal that this unconventional low-temperature epitaxy of rutile TiO 2 phase is achieved by lowering the activation barrier by increasing the "effective" oxygen pressure through a facile ionic pathway from VO 2-δ sacrificial templates. This discovery shows a robust control of defect-induced properties at oxide interfaces by the mismatch of thermodynamic driving force, and also suggests a strategy to overcome a kinetic barrier to phase stabilization at exceptionally low temperature.

Programmable optoelectronic devices call for the reversible control of the photocarrier recombination process by in‐gap states in oxide semiconductors. However, previous approaches to produce oxygen vacancies as a source of in‐gap states in oxide semiconductors have hampered the reversible formation of oxygen vacancies and their related phenomena. Here, a new strategy to manipulate the 2D photoconductivity from perovskite stannates is demonstrated by exploiting spatially selective photochemical reaction under ultraviolet illumination at room temperature. Remarkably, the ideal trap‐free photocurrent of air‐illuminated BaSnO3 (≈200 pA) is reversibly switched into three orders of magnitude higher photocurrent of vacuum‐illuminated BaSnO3 (≈335 nA) with persistent photoconductivity depending on ambient oxygen pressure under illumination. Multiple characterizations elucidate that ultraviolet illumination of BaSnO3 under low oxygen pressure induces surface oxygen vacancies as a result of surface photolysis combined with the low oxygen‐diffusion coefficient of BaSnO3; the concentrated oxygen vacancies are likely to induce a two‐step transition of photocurrent response by changing the characteristics of in‐gap states from the shallow level to the deep level. These results suggest a novel strategy that uses light–matter interaction in a reversible and spatially confined way to manipulate functionalities related to surface defect states, for the emerging applications using newly discovered oxide semiconductors.

Unrestricted integration of single-crystal oxide films on arbitrary substrates has been of great interest to exploit emerging phenomena from transition metal oxides for practical applications. Here, we demonstrate the release and transfer of a freestanding single-crystalline rutile oxide nanomembranes to serve as an epitaxial template for heterogeneous integration of correlated oxides on dissimilar substrates. By selective oxidation and dissolution of sacrificial VO2 buffer layers from TiO2/VO2/TiO2 by H2O2, millimeter-size TiO2 single-crystalline layers are integrated on silicon without any deterioration. After subsequent VO2 epitaxial growth on the transferred TiO2 nanomembranes, we create artificial single-crystalline oxide/Si heterostructures with excellent sharpness of metal-insulator transition ($$\triangle \rho /\rho$$ △ ρ / ρ > 103) even in ultrathin (<10 nm) VO2 films that are not achievable via direct growth on Si. This discovery offers a synthetic strategy to release the new single-crystalline oxide nanomembranes and an integration scheme to exploit emergent functionality from epitaxial oxide heterostructures in mature silicon devices.

Reversible phase transformation of correlated oxides by field‐driven ionic process present opportunity to efficiently transduce between ionic transfer and electrical currents in insertion‐based reconfigurable transistors. However, the switching rate of insertion transistors is fundamentally limited by the slow rate of ionic insertion into the lattices of correlated oxides. Here, it is demonstrated that preformed oxygen vacancies in VO2−δ lattices strongly accelerate proton insertion by low gate voltage in synaptic transistors. As the degree of oxygen deficiency δ increases in VO2−δ transistors, the steepness of phase transformation and transconductance increase during the voltage sweep at the expense of the channel current modulation. Theoretical and experimental analyses reveal that the accelerated of H+ kinetics in the VO2−δ lattice occurs because immobile oxygen vacancies reduce the energy barrier to H+ migration. In an electronic synapse, this facile H+ migration in VO2−δ lattices renders “inscribed” memory by positioning the H+ neurotransmitter far from the electrolyte/VO2−δ interface. This discovery suggests a strategy to improve the learning and memory processes of artificial synaptic devices by controlling the density of intrinsic defects in the lattice framework to achieve efficient ion exchange.

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