Low Temperature Co-fired Ceramics (LTCC) have excellent high-frequency characteristics and have widely been used for microwave electronic components. By lowering the sintering temperature of the ceramics used as insulating layers, LTCC was co-fired with a high-conductivity wiring conductor, such as Cu or Ag. LTCC substrate has been expected as one of the most promising technologies to realize miniaturization of RF circuits in the field of wireless communications. There is no limitation to demand for further downsizing of RF circuits, suppression of electric loss and high mechanical strength of the substrate. However, conventional LTCC materials for substrates contain glass frit which causes defects, such as pores or cracks, and low mechanical strength. In this work, we have developed a novel LTCC material system BaO-Al2O3-SiO2-MnO-TiO2, without any glass frits. The material was co-fired with cupper electrodes, which have low resistivity and show less diffusion than silver in LTCC, under a low-oxygen partial pressure atmosphere (mixture of N2 and H2) at 980°C. Thin layers (8μm) of the material showed high insulating resistivity and reliability due to few defects, such as pores, in LTCC. Its dielectric and mechanical properties were measured as 6.8 (low-εr), 350 at 3GHz (high-Q-value) and 341MPa (high mechanical strength) respectively. This LTCC material will contribute to further miniaturizing of microwave applications and integration of passive elements.
A simple approach for creating organogel in situ through formation of a reversible imine bond known as a dynamic covalent bond is described. As the condensations of the glutamate-based amine compounds and salicylaldehyde or 2-hydroxy-1-naphthaldehyde in alcohols such as MeOH, EtOH and propanol as well as DMF proceed, gelation occurs in situ depending on the condition. Addition of a small amount of acid and water to a resultant gel induces its collapse due to returning to the corresponding amines and aldehydes. No such a gelation was observed when combining benzaldehyde or naphthaldehyde.
Atomic hydrogen dry etching was used for microstructure fabrication. Photolithography was proposed and achieved by a dry development process using atomic hydrogen irradiation. The reaction system of poly(methyl methacrylate) mixed with molecular benzophenone was examined as a model system for a proof-of-concept study. Optical patterning was experimentally made on a thin layer of poly(methyl methacrylate) with benzophenone by UV light exposure with a photomask. The reaction system acted as a negative tone resist in the proposed process. Thus, a model system for a new atomic hydrogen dry development process was proposed and successfully demonstrated.
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