Articles you may be interested inEffect of oxygen plasma on field emission characteristics of single-wall carbon nanotubes grown by plasma enhanced chemical vapour deposition system J. Appl. Phys. 115, 084308 (2014); 10.1063/1.4866995Low threshold field emission from high-quality cubic boron nitride films J. Appl. Phys. 111, 093728 (2012); 10.1063/1.4711093Effect of cubic phase evolution on field emission properties of boron nitride island films An individual multiwall carbon nanotube ͑CNT͒ synthesized without a catalyst by an arc discharge method is bonded to a tungsten tip. Field emission characteristics of the individual CNT coated with a boron nitride ͑BN͒ nanofilm are investigated. The BN film is synthesized by plasma-assisted chemical vapor deposition method in which boron trichloride ͑BCl 3 ͒ and nitrogen ͑N 2 ͒ are used as source gases. Deposition of the BN film with a thickness less than 10 nm onto the individual CNT is attempted. Field emission characteristics are measured in the chamber evacuated to 2 ϫ 10 −8 Pa. An anode electrode is set 25 mm away from the CNT sample. The turn-on electric field, designated as an electric field at an emission current of 1.0 nA, is compared between individual CNTs with and without the BN nanofilm. A significant reduction in the turn-on electric field is achieved by coating with the BN nanofilm. The turn-on electric field is estimated to be 1.2ϫ 10 −2 V / m for the uncoated individual CNT sample, and the turn-on electric field is estimated to be 8.2ϫ 10 −3 V / m for the CNT sample coated with BN nanofilm. Moreover, stable operation is demonstrated at an emission current as high as 1 ϫ 10 −5 A.
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