Indium nitride (InN) surfaces treated with ammonium sulfide [(NH4)2Sx] are investigated using Hall effect measurement, x-ray photoelectron spectroscopy (XPS), and scanning Kelvin probe microscopy (SKPM). Upon the (NH4)2Sx treatment, the sheet carrier density is reduced by (0.8–0.9)×1013 cm−2, leading to an increase in the sheet resistance. By numerically solving the Poisson’s equation, the associated upward shift of the surface band bending is derived to be 0.3 eV. XPS characterization shows, on the (NH4)2Sx treated InN surface, the formation of native oxide is effectively suppressed and a covalently bonded sulfur layer with surface In atoms is formed. This surface In–S dipole layer results in an increase in the electron affinity, thus giving rise to a lower surface bending shift (0.2 eV) observed in XPS. The electron affinity increase of 0.1 eV can be deduced, which is consistent with the result obtained by SKPM. Thus, the (NH4)2Sx treatment has been demonstrated to be an effective method for reducing the surface band bending for InN.
The exceptionally large electron affinity of InN causes the pinning of surface Fermi level well above the conduction band minimum. This unique electronic property leads to the electron accumulation at InN surfaces and a large built-in electric field in the topmost few nanometers of InN surfaces. In this letter, we demonstrate that this surface electric field can be unambiguously determined and monitored in a-plane wurtzite InN surface via time-resolved electric-field-induced second harmonic generation. This finding makes it possible to directly probe and characterize the surface electronic properties of Mg-doped InN with an all-optical technique in ambient environment.
The electrical properties of N-polar undoped InN and nonpolar a-InN:Mg ion sensitive field effect transistors (ISFETs) have been investigated by electrolyte-gate-biased current-voltage (IDS-VGS) measurements. IDS-VGS characteristics reveal that the a-InN:Mg ISFETs have a large (∼52%) current variation ratio at a gate bias of 0.3 V with respect to the unbiased one, which is higher than that from the undoped InN ISFETs (∼18% and <0.1% for 10-nm and 1-μm-thick −c-InN epilayers, respectively). The a-InN:Mg ISFETs can also function as a pH sensor with a sensitivity of 56.5 mV/pH and a response time less than 10 s.
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