Metallic single-electron transistors (SETs) with niobium nanodots were fabricated, and their high-frequency rectifying characteristics were evaluated. By reducing the gap size of the electrodes and film deposition area to nanometer scale, improved SET characteristics with gate control, and better frequency response of the rectifying current with gentler decrease than 1/f at high frequency were achieved. The comparison between the characteristics of micrometer- and nanometer-size devices are made, and the reason for their differences are discussed with a help of simulation based on the experimentally extracted parameters.
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