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We present a new formation technology for a plasma display panel (PDP) barrier-rib structure by which we can obtain a barrier-rib with a high aspect ratio and reduce the manufacturing cost. Firstly, a precise metal mould is manufactured for massively replicating the PDP barrier-rib construction using the UV-LIGA process with a thick negative photoresist (SU-8 50: Microchem Corp). The proposed sequence includes several processes: amorphous silicon as an adhesion layer; dipping into xylene and n-butyl acetate after the development of SU-8; two step removal of the SU-8 layer; rip-off process, etc. The proposed processes produce a copper mould with a high aspect ratio, good surface roughness and a uniform thickness. Secondly, a PDP barrier-rib structure is formed using the roll-pressing method with a reusable metal mould fabricated by the proposed UV-LIGA process. This is a very simple and inexpensive method consisting of printing the barrier-rib paste, drying, roll-pressing and firing. Consequently, by combining the UV-LIGA and roll-pressing processes, the desired barrier-rib shapes can be made with a high aspect ratio and various dimensions. The combination of the UV-LIGA and roll-pressing processes also demonstrates the possibility of achieving two major goals in the barrier-rib processes; i.e., developing a barrier-rib structure with a high aspect ratio that can be applied to high-definition televisions, and reducing the manufacturing cost.