Fabricating electronic devices require integrating metallic conductors and polymeric insulators in complex structures. Current metal-patterning methods such as evaporation and laser sintering require vacuum, multistep processes, and high temperature during sintering or postannealing to achieve desirable electrical conductivity, which damages low-temperature polymer substrates. Here reports a facile ecofriendly room-temperature metal printing paradigm using visible-light projection lithography. With a particle-free reactive silver ink, photoinduced redox reaction occurs to form metallic silver within designed illuminated regions through a digital mask on substrate with insignificant temperature change (<4 °C). The patterns exhibit remarkably high conductivity achievable at room temperature (2.4 × 10 7 S m −1 , ≈40% of bulk silver conductivity) after simple room-temperature chemical annealing for 1-2 s. The finest silver trace produced reaches 15 µm. Neither extra thermal energy input nor physical mask is required for the entire fabrication process. Metal patterns were printed on various substrates, including polyethylene terephthalate, polydimethylsiloxane, polyimide, Scotch tape, print paper, Si wafer, glass coverslip, and polystyrene. By changing inks, this paradigm can be extended to print various metals and metal-polymer hybrid structures. This method greatly simplifies the metal-patterning process and expands printability and substrate materials, showing huge potential in fabricating microelectronics with one system.

This paper presents a distortion correction method for designing a wide field of view (FOV) lens for an imaging system. The lens is composed of two aspheric surfaces and several spheres. In the preliminary design, profiles of the aspheric surfaces can be obtained according to aplanatism, refraction law, and polynomial fitting methods, where the numeric computation, the differential geometry computation, and the polynomial fitting algorithm are stated in detail. Then the lens is optimized by the damped least squares method. Theoretically, this method cannot eliminate aberrations absolutely but can balance some kinds of aberrations to the image well. Furthermore, a projector lens with a wide FOV, low distortion, and low throw ratio [TR = (projection distance)/(image diagonal size)] is designed successfully by this method.

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Holographic microscopy presents challenges for color reproduction due to the usage of narrow‐band illumination sources, which especially impacts the imaging of stained pathology slides for clinical diagnoses. Here, an accurate color holographic microscopy framework using absorbance spectrum estimation is presented. This method uses multispectral holographic images acquired and reconstructed at a small number (e.g., three to six) of wavelengths, estimates the absorbance spectrum of the sample, and projects it onto a color tristimulus. Using this method, the wavelength selection is optimized to holographically image 25 pathology slide samples with different tissue and stain combinations to significantly reduce color errors in the final reconstructed images. The results can be used as a practical guide for various imaging applications and, in particular, to correct color distortions in holographic imaging of pathology samples spanning different dyes and tissue types.