We aimed to develop a predictive model for intensive care unit (ICU)-discharged patients at risk of post-ICU deterioration. We performed a retrospective, single-centre cohort observational study by linking the hospital admission, patient pathology, ICU, and medical emergency team (MET) databases. All patients discharged from the Alfred Hospital ICU to wards between July 2012 and June 2014 were included. The primary outcome was a composite endpoint of any MET call, cardiac arrest call or ICU re-admission. Multivariable logistic regression analysis was used to identify predictors of outcome and develop a risk-stratification model. Four thousand, six hundred and thirty-two patients were included in the study. Of these, 878 (19%) patients had a MET call, 51 (1.1%) patients had cardiac arrest calls, 304 (6.5%) were re-admitted to ICU during the same hospital stay, and 964 (21%) had MET calls, cardiac arrest calls or ICU re-admission. A discriminatory predictive model was developed (area under the receiver operating characteristic curve 0.72 [95% confidence intervals {CI} 0.70 to 0.73]) which identified the following factors: increasing age (odds ratio [OR] 1.012 [95% CI 1.007 to 1.017] P <0.001), ICU admission with subarachnoid haemorrhage (OR 2.26 [95% CI 1.22 to 4.16] P=0.009), admission to ICU from a ward (OR 1.67 [95% CI 1.31 to 2.13] P <0.001), Acute Physiology and Chronic Health Evaluation (APACHE) III score without the age component (OR 1.005 [95% CI 1.001 to 1.010] P=0.025), tracheostomy on ICU discharge (OR 4.32 [95% CI 2.9 to 6.42] P <0.001) and discharge to cardiothoracic (OR 2.43 [95%CI 1.49 to 3.96] P <0.001) or oncology wards (OR 2.27 [95% CI 1.05 to 4.89] P=0.036). Over the two-year period, 361 patients were identified as having a greater than 50% chance of having post-ICU deterioration. Factors are identifiable to predict patients at risk of post-ICU deterioration. This knowledge could be used to guide patient follow-up after ICU discharge, optimise healthcare resources, and improve patient outcomes and service delivery.
We have shown that process effects induced by extending the softbake (SB) and post-exposure bake (PEB) temperature in the process flow of chemically amplified photoresists can lead to significant improvements in Depth-of-Focus (DOF) and Exposure latitude (EL) and small geometry printing capability (resolution). Through careful optimization of SB and PEB temperature, dense line and space structures of 160nm and below can be printed with substantially big process margin, using binary masks and 248nm lithography under the half annular illumination mode. Besides, we have also shown that the optical proximity effect, namely the non-linearity, proximity bias and line-end shortening in specific is tunable by changing the SB and PEB temperatures. The main objective of this study is to demonstrate how, using 248nm lithography with binary masks and with a moderate Resolution Enhancement Technique (RET); the process latitude can be improved besides minimizing the impact from optical proximity effect.
In this paper, we presented a new furnace loading procedure with speciallyprepared monitor wafer (SPMW) to prevent scrapping wafers placed at top slot of the furnace boat and other slots if lot has < 25 wafers. These wafers showed Vgs OOS on high side. Our investigation showed that non-
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.