In this work, a whole manufacturing process of the curved copper nanowires (CCNs) based flexible transparent conductive electrode (FTCE) is reported with all solution processes, including synthesis, coating, and networking. The CCNs with high purity and good quality are designed and synthesized by a binary polyol coreduction method. In this reaction, volume ratio and reaction time are the significant factors for the successful synthesis. These nanowires have an average 50 nm in width and 25-40 μm range in length with curved structure and high softness. Furthermore, a meniscus-dragging deposition (MDD) method is used to uniformly coat the well-dispersed CCNs on the glass or polyethylene terephthalate substrate with a simple process. The optoelectrical property of the CCNs thin films is precisely controlled by applying the MDD method. The FTCE is fabricated by networking of CCNs using solvent-dipped annealing method with vacuum-free, transfer-free, and low-temperature conditions. To remove the natural oxide layer, the CCNs thin films are reduced by glycerol or NaBH4 solution at low temperature. As a highly robust FTCE, the CCNs thin film exhibits excellent optoelectrical performance (T = 86.62%, R(s) = 99.14 Ω ◻(-1)), flexibility, and durability (R/R(0) < 1.05 at 2000 bending, 5 mm of bending radius).

Recently, nanofibrillated cellulose with cationic functional groups was synthesized. This trimethylammonium-modified nanofibrillated cellulose (TMA-NFC) was applied in this study for the preparation of composites with various layered silicates. These belonged to the groups of montmorillonite, kaolin, talc, vermiculite, and mica. The respective composites were prepared by high-shear homogenization followed by filtration and hot-pressing. Data on crystal structures, chemical compositions, cation exchange capacity, specific surface area, density, and morphology of all clays and micas themselves as well as structure information of the corresponding composites have been collected. Possible microstructural features responsible for the composite appearances were tentatively identified. Principally, the interactions between TMA-NFC and the layered silicates were pronounced, due to electrostatic attraction of cationic cellulose fibrils and anionic silicate layers. This mutual interaction between TMA-NFC and layered silicate, however, was influenced not only by layered silicate properties but also by the composite preparation method, as discussed in this study.

We report an effective method for fabricating highly transparent and stretchable large-area conducting films based on a directional arrangement of silver nanowires (AgNWs) driven by a shear force in a microliter-scale solution process. The thin conducting films with parallel AgNWs or cross-junctions of AgNWs are deposited on the coating substrate by dragging a microliter drop of the coating solution trapped between two plates. The optical and electrical properties of the AgNW thin films are finely tuned by varying the simple systematic parameters in the coating process. The transparent thin films with AgNW cross-junctions exhibit the superior electrical conductivity with a sheet resistance of 10 Ω sq(-1) at a transmittance of 85% (λ = 550 nm), which is well described by the high ratio of DC to optical conductivity of 276 and percolation theory in a two-dimensional matrix model. This simple coating method enables the deposition of AgNW thin films with high optical transparency, flexibility, and stretchability directly on plastic substrates.

Graphene, an atomically thin layer of two-dimensional carbon nanostructure, has received intense attention in recent years because of its extraordinary optoelectronic properties and potential applications in microelectronics. [1][2][3][4] While high-quality graphene has been produced by chemical vapor deposition (CVD) on metallic surfaces [ 5 , 6 ] and graphitization of a single crystal SiC, [ 7 ] reduced graphene oxide (rGO) is also considered as a promising electronic nanomaterial because of its solution processability, residual chemically active sites, and high-volume production at low cost. [ 4 , 8 , 9 ] In the form of a single-layer sheet or fi lms of a few layers, rGO has been employed in various electronic devices including chemical/biological sensors, [ 10 , 11 ] fi eldeffect transistors (FETs), [ 8 , 12 ] transparent electrodes, [ 13 , 14 ] and photovoltaics. [ 15 ] However, previous studies have largely focused on a single electronic device or sensor. To fabricate practical and reproducible rGO-based microelectronics, a scalable and effective method for high-resolution rGO micropatterns on various substrates is highly desirable.Top-down lithographic techniques have been widely used to create rGO micropatterns by selectively etching parts of rGO thin fi lms. [ 12 , 16-18 ] Although a variety of well-defi ned rGO patterns can be obtained from such lithographic methods, they are time-consuming, involve complex procedures, and give rise to undesirable contamination of the patterned surface from contact with sacrifi cial masks. Alternatively, rGO patterning has been explored with nonlithographic routes such as micromolding in capillaries [ 19 , 20 ] and solvent evaporation-driven self-assembly process. [ 21 ] These methods, however, are often limited to simple patterned structures such as stripes, because the assembly of GO fl akes occurs in a restricted geometry. In addition, although various printing techniques including inkjet printing, [ 22 , 23 ] transfer printing [ 24 , 25 ] and imprinting [ 26 ] have also been applied for rGO patterning, the production of highresolution and reproducible rGO micropatterns on a large scale still remains a challenging task.In this study, we report a simplifi ed and scalable approach for fabricating high-resolution rGO micropatterns over a large area directly on various substrates by plasma-enhanced detachment patterning (PEDP). This method is based on the selective removal of unwanted regions of uniform rGO thin fi lms by conformal contact with pre-patterned elastomeric molds without additional pressurization and/or heating. The procedure for fabricating the rGO micropatterns is schematically illustrated in Figure 1 . Highly uniform rGO thin fi lms were prepared on a variety of substrates using meniscus-dragging deposition (MDD) technique. [ 27 ] After oxygen plasma treatment of both surfaces, the pre-patterned poly(dimethyl siloxane) (PDMS) molds were simply placed on the rGO thin fi lms. The introduction of the oxygen plasma engineered the relative surface ene...

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