We present a systematic process of theoretical design and experimental fabrication of the large mode area and large negative dispersion photonic crystal fiber. An easily fabricated fiber structure is proposed. The influence of structure parameters deviations from the design on the chromatic dispersion are evaluated and a design rule is given. Finally our fabricated fiber and test results are demonstrated. The measured effective area of inner core mode is 40.7 mum(2) which is the largest effective area of high negative dispersion photonic crystal fibers that have been experimentally fabricated. The measured peak dispersion is -666.2ps/(nm.km) and the bandwidth is 40nm.

A single-longitudinal-mode dual-wavelength distributed feedback fiber laser with a wavelength spacing of 0.312 nm is proposed and demonstrated. Based on two spatially separated resonant cavities in a single fiber Bragg grating made by a simple method, stable dual-wavelength lasing is established. Then, a 38.67-GHz microwave signal generated by beating the two lasing wavelengths is obtained with a 3-dB bandwidth of 6 kHz and a frequency drift 5 MHz without any feedback mechanism. As a potential application of this device, a tunable microwave source ranging from 18.67 to 58.67 GHz (with a small discontinuity) is proposed and partially demonstrated.

A SiN-Si dual-layer optical phased array (OPA) chip is designed and fabricated. It combines the low loss of SiN with the excellent modulation performance of Si, which improves the performance of Si single-layer OPA. A novel optical antenna and an improved phase modulation method are also proposed, and a two-dimensional scanning range of 96 ° × 14 ° is achieved, which makes the OPA chip more practical.

The reconstruction algorithm is first applied to a sampled Bragg grating (SBG) with chirp in the sampling period. This method is demonstrated to achieve various profiles of both reflection and group delay within one channel of the SBG. This method has the advantage that the phase mask does not need any chirp, and only submicrometer precision is needed in the fabrication process. Based on this method, a tunable dispersion compensator is fabricated with a tuning range of 300 ps/nm in a flat band of 1 nm.