A direct assay system for conjugated bile acids using an enzymatic procedure and high-performance liquid chromatography was used for the analysis of urinary bile acid profiles in young infants with intrahepatic cholestasis (idiopathic neonatal hepatitis syndrome) or extra-hepatic biliary atresia. The major urinary bile acids were cholate and chenodeoxycholate conjugates, but a small amount of deoxycholate and 3 beta-hydroxy-5-cholenate conjugates were detected. Although there was no significant difference in total bile acid excretion between patients with intrahepatic cholestasis and extrahepatic biliary atresia, mean ratios of cholate to chenodeoxycholate and sulfated to total urinary bile acids were different between the two groups examined (5.63 +/- 2.83 vs. 2.50 +/- 1.25, p less than 0.05, 15.8 +/- 9.9 vs. 34.5 +/- 9.9%, p less than 0.005). The proportion of taurine-conjugated chenodeoxycholate in the sulfate fraction to the total bile acid was lower in intrahepatic cholestasis, compared with that in biliary atresia (7.7 +/- 7.5 vs 22.7% +/- 7.8%, p less than 0.005). The greater ratio of cholate to chenodeoxycholate and the reduced excretion of sulfated urinary bile acids in intrahepatic cholestasis was due to decreased taurine-conjugated chenodeoxycholate sulfate excretion.
Much effort has been done to detect the defects of interest (DOI) by optical inspection systems because the size of the DOI shrinks according to the design rule of a semiconductor device. Performance of the inspection system is dependent on complicated optical conditions on illumination and collection systems including wavelength and polarization filter. Magnitude of defect signal for a given optical condition was estimated using a simulation tool to find a suitable optical condition and technologies required in the future. This tool, consisting of a near-field calculation using Finite Difference Time Domain (FDTD) methods and an image formation calculation based on Fourier optics, is applicable not only to Köhler illumination system but also to confocal system and dark field system. We investigated defect inspection methods for the 45 nm and the next technology nodes. For inspection of various defects, the system using several wavelengths is suitable. For inspection of a specific defect, the system with polarization control is suitable. Our calculation suggests that the defect detection sensitivity for the 1X nm technology node should be increased by more than 10 times compared to the 45 nm technology node.
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