Single-crystal silicon nanostructures have attracted much attention in recent years due in part to their unique optical properties. In this work, we demonstrate direct fabrication of single-crystal silicon nanotubes with sub-10 nm walls which show low reflectivity. The fabrication was based on a cryogenic inductively coupled plasma reactive ion etching process using high-resolution hydrogen silsesquioxane nanostructures as the hard mask. Two main etching parameters including substrate low-frequency power and SF6/O2 flow rate ratio were investigated to determine the etching mechanism in the process. With optimized etching parameters, high-aspect-ratio silicon nanotubes with smooth and vertical sub-10 nm walls were fabricated. Compared to commonly-used antireflection silicon nanopillars with the same feature size, the densely packed silicon nanotubes possessed a lower reflectivity, implying possible potential applications of silicon nanotubes in photovoltaics.
Abstract-In the applications of solar cells, reflection is an unwanted loss process. Using antireflective solar glass can improve the generating efficiency of solar cells. Here the design, synthesis, modification, and characterization of the nano antireflective film for solar modules are reported. Nanometer SiO2 antireflection coating solution was prepared by Sol-gel method. Porous membrane with visible light transmittance of up to 98.2% can be derived from basecatalyzed sol. With modification of the mechanical durability of the samples, the transmittance was improves to 97.43%. Average over wavelength range from 400 to 800 nm, the reflection losses were reduced to only 3.44% by applying the nanometer SiO2 antireflection coating to the cover glass, that is , the AR coating achieves a transmittance enhancement of 5.6% comparing to the original glass. Uniform antireflection and high scratch have been achieved.
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