Monte Carlo simulations are adopted to study the space distribution of the particles in the mixture of CH 4 /H 2 /H 2 S/Ar considering the avalanche collision and dissociative ionization of electrons based on the theory of glow discharge in electron-assisted chemical vapor deposition (EACVD) system. The relationship between the space distribution and the recombination rate of H and CH 3 , CH 3 + fragment particles is given. The dynamic process of the n-type doped diamond film is simulated under different gas pressure. The particle distributions of S, S + and Ar + are also obtained. The result is very important for investigation of n-type diamond film doping at low temperature.
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