Oxygen incorporation into ZnTe was studied using pulsed laser deposition and molecular beam epitaxy. Oxygen incorporation at the high partial pressures studied for pulsed laser deposition was found to result in increasing visible transparency with oxygen incorporation, and is attributed to the formation of TeO x based on bonding information obtained by x-ray photoelectron spectroscopy measurements. Oxygen incorporation by a plasma source during the growth of ZnTe by molecular beam epitaxy was found to result in an electronic band at 0.5 eV below the ZnTe band edge, possessing strong radiative properties and a resonant-like optical absorption coefficient with a peak a > 5000 cm -1 . The ZnTeO thin films grown by MBE have an epitaxial structure similar to ZnTe, where it is unclear whether the properties are due to the formation of a high-density defect level or the formation of a dilute alloy.

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The electrical properties of several metal contacts to n-type ZnO (0001) were studied. The ZnO samples consisted of bulk single-crystal material, epitaxial layers on sapphire grown by molecular beam epitaxy (MBE), and polycrystalline thin films on sapphire obtained by pulsed laser deposition (PLD). Ohmic and rectifying contacts were observed dependent upon both the metal material and the ZnO surface. Ohmic contacts were characterized using the circular transmission line method (c-TLM), where contact resistivity was found to be in the range of 10 Ϫ4 Ϫ10 Ϫ5 Ω-cm 2 . Schottky behavior was observed using Ag contacts exhibiting varying leakage current and breakdown voltage dependent on the polarity of the ZnO surface.

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