In this work, a dynamic arched magnetic field steered arc source was deigned by virtue of Finite Element Method (FEM) calculation. The magnetic field was produced by two main electromagnetic coils so that the magnetic field can be adjusted with the help of the two currentI1and I2,whereI1is the current to the internal coil mounted coaxially in a magnetic yoke generating a static arched magnetic field to confine the cathode spots and I2is the current to the external coil mounted coaxially outside the above yoke adjusting the position of the vertex of arch. Base on the results of simulation, it was found this design enable the sweeping of the arc spots on the target surface by means of adjusting the ratio of current (I1/I2) , and cause the arc distribute evenly on the cathode surface in the diffuse arc mode transferred from the constricted arc mode. The effects of the target thickness and current ratio on the configuration and intensity of dynamic arched magnetic field were investigated. The optimized operating modes was proposed and discussed.
Against some problems which exist in the current embedded graphical user interface development such as low efficiency in the operating, poor portability and so on. This paper brings up an embedded GUI development method based on Qt/Embedded. Firstly, the construction technology of X11 virtual compiler platform and the implementation technology of cross-compile environment are described in details which are necessary in GUI development. Secondly, the Qt library file is cut, and the picture is displayed with Chinese-characters in accordance with the specific embedded goal. In the end, prove the valid of the development method based on Qt/Embedded through applications.
Based on plasma physics, basic characteristics of magnetofluid and discharge mechanism of the arc spot, this paper proposes a deposition technology on the inner wall of long tube by magnetic and electric field enhanced arc ion plating. The conical target material structure immersed in the axial magnetic field is adopted as the arc source of arc ion plating. Studies have shown that this technology can achieve the effective coating on the inner wall of long tube, which means to deposit the fatal (Ti, Al) N films at the depth of 120mm in the inner wall of the 20mm stainless steel component. The thickness of (Ti, Al) N film is 0.3-1.5m and its micro-hardness reaches 20GPa, which can significantly improve the wear resistance and corrosion resistance of the inner wall of the components, thereby increasing the service life of stainless steel components.
In this design, the concept of static magnetic field was given up and the idea of controlling the arc discharge by transverse rotating magnetic field (TRMF) was put forward. Based on the principle of RMF generation, the specific scheme and the cohesiveness integral structure design of the TRMF steered arc source were constructed. In the specific design, a bipolar symmetric RMF (N-S) parallel to the cathode surface and homogenously covered the whole cathode was generated by stationary three-phase windings carrying three-phase alternating currents without any visible physical rotation. Through changing the frequency and the amplitude of the exciting current (these two parameters can be adjusted independently), the speed of rotation and the magnetic intensity could be regulated continuously. Experiments about TRMF steered arc source used in vacuum arc deposition (VAD) showed that: the arc voltage increased with not only an increase in the intensity of magnetic field connected with the supplied current but also an increase in the frequency of magnetic field. TRMF could reduce MPs content to a great extent and get a smooth film surface. A high utilization of the target was achieved due to the homogenous arc discharge covered the entire cathode surface. We believe this design is a new-type arc source and it will bring inspiration and great interest in the VAD domain.
This paper systematically studies the distribution of macro-particles on the surface of film influenced by the substrate position under conditions of the same magnetic field, different pulsed bias voltage and reaction gas partial pressure, and analyzes the mechanism of macro-particles influenced by different parameters. This study indicates that the substrate position has a better effect on decreasing macro-particles than that of the pulsed bias voltage and particles in different substrate position are very different in their forms and appearances, which easily leads to uneven deposition; under the same bias, the number of particles firstly increases and then decreases with the increasing the distance from substrate position to the center, and the number of particles with over 2μm diameter largely decreases with the increasing the distance from substrate position to the center, so surface morphologies of films are improving; under the lower intensity of magnetic field, the distribution of macro-particles has a great change with the increasing the distance from substrate position to the center, and under the higher intensity of magnetic field, the substrate position has little influence on the distribution of macro-particles on the surface of film. Under the higher intensity (30G) of magnetic field, the distribution of macro-particles on the surface of film has minor change whatever reaction gas partial pressure and substrate position increase, and most particles are small in sizes and are solid spherical in shape. The higher intensity (30G) of magnetic field enhances the uniformity of film deposition and decreases the dependency of macro-particles distribution on other parameters.
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