Herein, it is demonstrated, by using industrial techniques, that a passivation layer with nanocontacts based on silicon oxide (SiOx) leads to significant improvements in the optoelectronical performance of ultrathin Cu(In,Ga)Se2 (CIGS) solar cells. Two approaches are applied for contact patterning of the passivation layer: point contacts and line contacts. For two CIGS growth conditions, 550 and 500 °C, the SiOx passivation layer demonstrates positive passivation properties, which are supported by electrical simulations. Such positive effects lead to an increase in the light to power conversion efficiency value of 2.6% (absolute value) for passivated devices compared with a nonpassivated reference device. Strikingly, both passivation architectures present similar efficiency values. However, there is a trade‐off between passivation effect and charge extraction, as demonstrated by the trade‐off between open‐circuit voltage (Voc) and short‐circuit current density (Jsc) compared with fill factor (FF). For the first time, a fully industrial upscalable process combining SiOx as rear passivation layer deposited by chemical vapor deposition, with photolithography for line contacts, yields promising results toward high‐performance and low‐cost ultrathin CIGS solar cells with champion devices reaching efficiency values of 12%, demonstrating the potential of SiOx as a passivation material for energy conversion devices.
High-quality coalescence overgrowth of patterned-grown GaN nanocolumns on c-plane sapphire substrate with metal organic chemical vapor deposition is demonstrated. Although domain structures of a tens of micron scale in the overgrown layer can be identified with cathodoluminescence measurement, from atomic force microscopy ͑AFM͒ measurement, the surface roughness of the overgrown layer in an area of 5 ϫ 5 m 2 is as small as 0.411 nm, which is only one-half that of the high-quality GaN thin-film template directly grown on sapphire substrate ͑the control sample͒. Based on the AFM and depth-dependent x-ray diffraction measurements near the surface of the overgrown layer, the dislocation density is reduced to the order of 10 7 cm −2 , which is one order of magnitude lower than that of the control sample and two to three orders of magnitude lower than those of ordinary GaN templates for fabricating light-emitting diodes. Also, the lateral domain size, reaching a level of ϳ2.7 m, becomes three times larger than the control sample. Meanwhile, the ratio of photoluminescence intensity at room temperature over that at low temperature of the overgrown sample is at least six times higher than that of the control sample. Although the strain in nanocolumns is almost completely released, a stress of ϳ0.66 GPa is rebuilt when the coalescence overgrowth is implemented.
The introduction of a thin electronic sieve layer of a material with a wide bandgap, such as lithium fluoride (LiF) or silicon oxide (SiOx), at the inorganic‐organic interface of an organic photovoltaic device enhances the charge separation and improves the efficiency by more than an order to a maximum of 6.04%.
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