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SiCN coatings with continuous composition between Si3N4 and S i c (rich in Si) have been prepared by acting on the tetramethylsilane (TMS)/ammonia ratio in the gas phase. The deposit compositions (10pm thick films) have been investigated by different means which stress the difficulties encountered. Nevertheless the trends are in fair agreement. An increase in ammonia partial pressure favors the incorporation of N in the deposits. XPS studies of the samples lead to the conclusion that the chemical environments of Si, C, N are more complicated than in a mixture situation; there would be various bonding states. Deposition rates range from 12pm h-1 up to 3OPm h-1 and are largely increased when dilution is reduced. Hardness and Young's modulus are driven by the CIN ratio : Hv lies between 22.6 GPa (Si3N4) to 26.2 GPa (Sic) with respectively apparent Young's modulus from 250-295 up to 357-431. All the films exhibit an adhesion of same order though N tends to increase the critical loads.